Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11885737 | Method and system for optical characterization of patterned samples | Dror Shafir, Gilad Barak, Shay Wolfling, Michal Haim YACHINI, Cornel Bozdog | 2024-01-30 |
| 11710616 | TEM-based metrology method and system | Vladimir Machavariani, Michael Shifrin, Daniel Kandel, Victor Kucherov, Igor Ziselman +1 more | 2023-07-25 |
| 11450541 | Metrology method and system | Vladimir Machavariani, Michael Shifrin, Daniel Kandel, Victor Kucherov, Igor Ziselman +1 more | 2022-09-20 |
| 11309162 | TEM-based metrology method and system | Vladimir Machavariani, Michael Shifrin, Daniel Kandel, Victor Kucherov, Igor Ziselman +1 more | 2022-04-19 |
| 11300948 | Process control of semiconductor fabrication based on spectra quality metrics | Taher Kagalwala, Alok Vaid, Shay Yogev, Paul ISBESTER, Yoav Etzioni | 2022-04-12 |
| 11295969 | Hybridization for characterization and metrology | Gangadhara Raja Muthinti, Roy Koret, Aron Cepler, Wei Ti Lee | 2022-04-05 |
| 10916404 | TEM-based metrology method and system | Vladimir Machavariani, Michael Shifrin, Daniel Kandel, Victor Kucherov, Igor Ziselman +1 more | 2021-02-09 |
| 10876959 | Method and system for optical characterization of patterned samples | Dror Shafir, Gilad Barak, Shay Wolfling, Michal Haim YACHINI, Cornel Bozdog | 2020-12-29 |
| 10664638 | Measuring complex structures in semiconductor fabrication | Taher Kagalwala, Sridhar Mahendrakar, Alok Vaid | 2020-05-26 |
| 10302414 | Scatterometry method and system | Gilad Wainreb, Etai Littwin, Alok Vaid, Michael Klots, Cornel Bozdog | 2019-05-28 |
| 10222710 | Method and system for planning metrology measurements | Niv Sarig, Charles N. Archie | 2019-03-05 |
| 10209206 | Method and system for determining strain distribution in a sample | Gilad Barak, Shay Wolfling, Cornel Bozdog | 2019-02-19 |
| 9330985 | Automated hybrid metrology for semiconductor device fabrication | Alok Vaid, Ned R. Saleh, Narender Rana | 2016-05-03 |
| 8157978 | Etching system and method for forming multiple porous semiconductor regions with different optical and structural properties on a single semiconductor wafer | Alok Vaid, Shahin Zangooie | 2012-04-17 |
| 7791723 | Optical measurement using fixed polarizer | Charles N. Archie, Shahin Zangooie | 2010-09-07 |
| 7760360 | Monitoring a photolithographic process using a scatterometry target | Charles N. Archie | 2010-07-20 |
| 7453583 | Assessment and optimization for metrology instrument including uncertainty of total measurement uncertainty | Charles N. Archie, G. William Banke, Jr. | 2008-11-18 |
| 7286247 | Assessment and optimization for metrology instrument including uncertainty of total measurement uncertainty | Charles N. Archie, G. William Banke, Jr. | 2007-10-23 |
| 7265850 | Fortified, compensated and uncompensated process-sensitive scatterometry targets | Charles N. Archie | 2007-09-04 |
| 7107177 | Combining multiple reference measurement collections into a weighted reference measurement collection | — | 2006-09-12 |
| 6361402 | Method for planarizing photoresist | Donald F. Canaperi, Rangarajan Jagannathan, Mahadevaiyer Krishnan, Max G. Levy, Uma Satyendra +2 more | 2002-03-26 |
| 6066566 | High selectivity collar oxide etch processes | Munir-ud-Din Naeem, Ting Wang | 2000-05-23 |
| 6001740 | Planarization of a non-conformal device layer in semiconductor fabrication | Kathryn H. Varian, Dirk Tobben | 1999-12-14 |
| 5976982 | Methods for protecting device components from chemical mechanical polish induced defects | Max G. Levy, Wolfgang Bergner, Bernhard Fiegl, George R. Goth, Paul C. Parries +3 more | 1999-11-02 |
| 5880007 | Planarization of a non-conformal device layer in semiconductor fabrication | Kathryn H. Varian, Dirk Tobben | 1999-03-09 |