Issued Patents All Time
Showing 26–50 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6518151 | Dual layer hard mask for eDRAM gate etch process | Babar A. Khan, Joyce C. Liu, Paul Wensley, Chienfan Yu | 2003-02-11 |
| 6208008 | Integrated circuits having reduced stress in metallization | Kenneth C. Arndt, Richard A. Conti, Laertis Economikos, Jeffrey P. Gambino, Peter D. Hoh +1 more | 2001-03-27 |
| 6207353 | Resist formulation which minimizes blistering during etching | Michael D. Armacost, Willard E. Conley, Tina J. Cotler-Wagner, Ronald A. DellaGuardia, Michael L. Passow +1 more | 2001-03-27 |
| 6153474 | Method of controllably forming a LOCOS oxide layer over a portion of a vertically extending sidewall of a trench extending into a semiconductor substrate | Herbert L. Ho, Radhika Srinivasan, Scott D. Halle, Erwin Hammerl, Jack A. Mandelman +1 more | 2000-11-28 |
| 6093281 | Baffle plate design for decreasing conductance lost during precipitation of polymer precursors in plasma etching chambers | Richard Wise, William C. Wille | 2000-07-25 |
| 6066570 | Method and apparatus for preventing formation of black silicon on edges of wafers | Dung-Ching Perng, Ting Wang, Klaus Roithner | 2000-05-23 |
| 6046487 | Shallow trench isolation with oxide-nitride/oxynitride liner | John Benedict, Philip L. Flaitz, Erwin Hammerl, Herbert L. Ho, James F. Moseman +3 more | 2000-04-04 |
| 6014310 | High dielectric TiO.sub.2 -SiN composite films for memory applications | Gary B. Bronner, Stephan A. Cohen, Jeffrey P. Gambino, Herbert L. Ho, Karen P. Madden | 2000-01-11 |
| 5998100 | Fabrication process using a multi-layer antireflective layer | Tsukasa Azuma, Tokuhisa Ohiwa, Tetsuo Matsuda, Katsuya Okumura | 1999-12-07 |
| 5939335 | Method for reducing stress in the metallization of an integrated circuit | Kenneth C. Arndt, Richard A. Conti, Laertis Economikos, Jeffrey P. Gambino, Peter D. Hoh +1 more | 1999-08-17 |
| 5899724 | Method for fabricating a titanium resistor | Stephen G. Fugardi, Erwin Hammerl, Herbert L. Ho, Samuel C. Ramac, Alvin W. Strong | 1999-05-04 |
| 5885899 | Method of chemically mechanically polishing an electronic component using a non-selective ammonium hydroxide slurry | Michael D. Armacost, Jeffery P. GAMBINO, Mark A. Jaso | 1999-03-23 |
| 5876788 | High dielectric TiO.sub.2 -SiN composite films for memory applications | Gary B. Bronner, Stephan A. Cohen, Jeffrey P. Gambino, Herbert L. Ho, Karen P. Madden | 1999-03-02 |
| 5763315 | Shallow trench isolation with oxide-nitride/oxynitride liner | John Benedict, Philip L. Flaitz, Erwin Hammerl, Herbert L. Ho, James F. Moseman +3 more | 1998-06-09 |
| 5759746 | Fabrication process using a thin resist | Tsukasa Azuma, Tokuhisa Ohiwa, Tetsuo Matsuda, Katsuya Okumura | 1998-06-02 |
| 5747866 | Application of thin crystalline Si.sub.3 N.sub.4 liners in shallow trench isolation (STI) structures | Herbert L. Ho, Erwin Hammerl, Herbert Palm, Stephen G. Fugardi, Atul Ajmera +2 more | 1998-05-05 |
| 5656535 | Storage node process for deep trench-based DRAM | Herbert L. Ho, Radhika Srinivasan, Scott D. Halle, Erwin Hammerl, Jack A. Mandelman +1 more | 1997-08-12 |
| 5643823 | Application of thin crystalline Si.sub.3 N.sub.4 liners in shallow trench isolation (STI) structures | Herbert L. Ho, Erwin Hammerl, J. Herbert Palm, Stephen G. Fugardi, Atul Ajmera +2 more | 1997-07-01 |
| 5622596 | High density selective SiO.sub.2 :Si.sub.3 N.sub.4 etching using a stoichiometrically altered nitride etch stop | Michael D. Armacost, Jeffrey P. Gambino, Son V. Nguyen | 1997-04-22 |
| 5563105 | PECVD method of depositing fluorine doped oxide using a fluorine precursor containing a glass-forming element | Tetsuo Matsuda, Son V. Nguyen, James G. Ryan, Michael J. Shapiro | 1996-10-08 |
| 5539154 | Fluorinated silicon nitride films | Son V. Nguyen, Douglas J. Dopp, David L. Harmon | 1996-07-23 |
| 5536360 | Method for etching boron nitride | Son V. Nguyen | 1996-07-16 |
| 5468687 | Method of making TA.sub.2 O.sub.5 thin film by low temperature ozone plasma annealing (oxidation) | Dan Carl, Son V. Nguyen, Tue Nguyen | 1995-11-21 |
| 5462812 | Fluorinated silicon nitride films | Son V. Nguyen, Douglas J. Dopp, David L. Harmon | 1995-10-31 |
| 5455204 | Thin capacitor dielectric by rapid thermal processing | Son V. Nguyen, Tue Nguyen | 1995-10-03 |