VS

Visweswaren Sivaramakrishnan

Applied Materials: 63 patents #111 of 7,310Top 2%
CI Crystal Solar, Incorporated: 8 patents #2 of 13Top 20%
ST Svagos Technik: 4 patents #2 of 7Top 30%
📍 Cupertino, CA: #140 of 6,989 inventorsTop 3%
🗺 California: #3,836 of 386,348 inventorsTop 1%
Overall (All Time): #25,233 of 4,157,543Top 1%
75
Patents All Time

Issued Patents All Time

Showing 51–75 of 75 patents

Patent #TitleCo-InventorsDate
7055809 Vaporizing reactant liquids for chemical vapor deposition film processing John M. White 2006-06-06
7024105 Substrate heater assembly Mark Fodor, Sophia M. Velastegui, Soovo Sen, Peter Wai-Man Lee, Mario David Silvetti 2006-04-04
6911403 Methods of reducing plasma-induced damage for advanced plasma CVD dielectrics Lihua Li, Tsutomu Tanaka, Tzu-Fang Huang, Li-Qun Xia, Dian Sugiarto +2 more 2005-06-28
6783118 Vaporizing reactant liquids for chemical vapor deposition film processing John M. White 2004-08-31
6663713 Method and apparatus for forming a thin polymer layer on an integrated circuit structure Stuardo Robles, Bang Nguyen, Gayathri Rao, Gary Fong, Vicente Lam +2 more 2003-12-16
6645303 Heater/lift assembly for high temperature processing chamber Jonathan Frankel, Hari Ponnekanti, Inna Shmurun 2003-11-11
6616973 Liquid phosphorous precursor delivery apparatus Chau Nguyen 2003-09-09
6444037 Chamber liner for high temperature processing chamber Jonathan Frankel 2002-09-03
6347636 Methods and apparatus for gettering fluorine from chamber material surfaces Li-Qun Xia, Srinivas D. Nemani, Ellie Yieh, Gary Fong 2002-02-19
6224681 Vaporizing reactant liquids for chemical vapor deposition film processing John M. White 2001-05-01
6132517 Multiple substrate processing apparatus for enhanced throughput Tirunelveli S. Ravi, Kramadhati V. Ravi 2000-10-17
6096134 Liquid delivery system Jun Zhao, Charles Dornfest, Vincent Ku, Frank Chang 2000-08-01
6063198 High pressure release device for semiconductor fabricating equipment Won Bae Bang, Estela Guijosa 2000-05-16
6019848 Lid assembly for high temperature processing chamber Jonathan Frankel, Inna Shmurun, Eugene Fukshansky 2000-02-01
6009827 Apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films Stuardo Robles, Maria Galiano, Victoria Kithcart 2000-01-04
5968588 In-situ liquid flow rate estimation and verification by sonic flow method Yen-Kun Wang, Fong Chang, Thanh Pham, Jeff Plante 1999-10-19
5935340 Method and apparatus for gettering fluorine from chamber material surfaces Li-Qun Xia, Srinivas D. Nemani, Ellie Yieh, Gary Fong 1999-08-10
5925189 Liquid phosphorous precursor delivery apparatus Chau Nguyen 1999-07-20
5879574 Systems and methods for detecting end of chamber clean in a thermal (non-plasma) process Gary Fong 1999-03-09
5872065 Method for depositing low K SI-O-F films using SIF.sub.4 /oxygen chemistry 1999-02-16
5814377 Method and apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films Stuardo Robles, Maria Galiano, Victoria Kithcart 1998-09-29
5725675 Silicon carbide constant voltage gradient gas feedthrough Gary Fong, Vincente Lim 1998-03-10
5648175 Chemical vapor deposition reactor system and integrated circuit Kathleen S. Russell, Stuardo Robles, Bang Nguyen 1997-07-15
5645642 Method for in-situ liquid flow rate estimation and verification Hiroshi Nishizato, Jun Zhao 1997-07-08
5520969 Method for in-situ liquid flow rate estimation and verification Hiroshi Nishizato, Jun Zhao 1996-05-28