Issued Patents All Time
Showing 26–50 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10332772 | Multi-zone heated ESC with independent edge zones | Kyle Tantiwong, Vladimir Knyazik | 2019-06-25 |
| 10271416 | High efficiency triple-coil inductively coupled plasma source with phase control | Waheb Bishara, Ryan Giar, Valentin N. Todorow, Dmitry Lubomirsky, Kyle Tantiwong | 2019-04-23 |
| 10163606 | Plasma reactor with highly symmetrical four-fold gas injection | Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating | 2018-12-25 |
| 10008368 | Multi-zone gas injection assembly with azimuthal and radial distribution control | Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating | 2018-06-26 |
| 9978620 | Method and apparatus for reducing radiation induced change in semiconductor structures | Gary E. Dickerson, Seng (victor) Keong Lim, Gregory L. Kirk, Mehdi Vaez-Iravani | 2018-05-22 |
| 9945033 | High efficiency inductively coupled plasma source with customized RF shield for plasma profile control | Vladimir Knyazik, Waheb Bishara, Valentin N. Todorow | 2018-04-17 |
| 9779953 | Electromagnetic dipole for plasma density tuning in a substrate processing chamber | Joseph AuBuchon, Tza-Jing Gung | 2017-10-03 |
| 9659803 | Electrostatic chuck with concentric cooling base | Dmitry Lubomirsky, Kyle Tantiwong | 2017-05-23 |
| 9646893 | Method and apparatus for reducing radiation induced change in semiconductor structures | Gary E. Dickerson, Seng (victor) Keong Lim, Gregory L. Kirk, Mehdi Vaez-Iravani | 2017-05-09 |
| 9536710 | Tunable gas delivery assembly with internal diffuser and angular injection | Vladimir Knyazik, Kyle Tantiwong, Waheb Bishara | 2017-01-03 |
| 9472378 | Multiple zone coil antenna with plural radial lobes | Vladimir Knyazik, Kyle Tantiwong | 2016-10-18 |
| 9406540 | Self-bias calculation on a substrate in a process chamber with bias power for single or multiple frequencies | Gary Leray, Valentin N. Todorow | 2016-08-02 |
| 9312104 | Coil antenna with plural radial lobes | Vladimir Knyazik, Kyle Tantiwong | 2016-04-12 |
| 9287147 | Substrate support with advanced edge control provisions | Kyle Tantiwong | 2016-03-15 |
| 9257265 | Methods for reducing etch nonuniformity in the presence of a weak magnetic field in an inductively coupled plasma reactor | Alvaro Garcia de Gorordo, Waheb Bishara | 2016-02-09 |
| 8988848 | Extended and independent RF powered cathode substrate for extreme edge tunability | Valentin N. Todorow, Imad Yousif, Albert Wang, Gary Leray | 2015-03-24 |
| 8974684 | Synchronous embedded radio frequency pulsing for plasma etching | Ankur Agarwal | 2015-03-10 |
| 8956886 | Embedded test structure for trimming process control | Olivier Joubert, Lei Lian, Maxime Darnon, Nicolas Posseme, Laurent Vallier | 2015-02-17 |
| 8937800 | Electrostatic chuck with advanced RF and temperature uniformity | Dmitry Lubomirsky, Jennifer Y. Sun, Mark Markovsky, Konstantin Makhratchev, Douglas A. Buchberger, Jr. | 2015-01-20 |
| 8933628 | Inductively coupled plasma source with phase control | Zhigang Chen, Valentin N. Todorow | 2015-01-13 |
| 8578879 | Apparatus for VHF impedance match tuning | Kartik Ramaswamy, Hiroji Hanawa, Kenneth S. Collins, Lawrence Wong, Andrew Nguyen | 2013-11-12 |
| 8492980 | Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system | Valentin N. Todorow, TSE-CHIANG WANG, Xing Lin | 2013-07-23 |
| 8368308 | Inductively coupled plasma reactor having RF phase control and methods of use thereof | Valentin N. Todorow | 2013-02-05 |
| 8360003 | Plasma reactor with uniform process rate distribution by improved RF ground return path | Andrew Nguyen, Hiroji Hanawa, Kartik Ramaswamy, Anchel Sheyner, Valentin N. Todorow | 2013-01-29 |
| 8299391 | Field enhanced inductively coupled plasma (Fe-ICP) reactor | Valentin N. Todorow, Kartik Ramaswamy, Michael D. Willwerth | 2012-10-30 |