MB

Mihaela Balseanu

Applied Materials: 70 patents #91 of 7,310Top 2%
CF Cornell Research Foundation: 2 patents #418 of 1,638Top 30%
IBM: 2 patents #32,839 of 70,183Top 50%
📍 Sunnyvale, CA: #176 of 14,302 inventorsTop 2%
🗺 California: #4,195 of 386,348 inventorsTop 2%
Overall (All Time): #27,397 of 4,157,543Top 1%
72
Patents All Time

Issued Patents All Time

Showing 51–72 of 72 patents

Patent #TitleCo-InventorsDate
8536069 Multilayered low k cap with conformal gap fill and UV stable compressive stress properties Stephan A. Cohen, Alfred Grill, Thomas J. Haigh, Jr., Son V. Nguyen, Li-Qun Xia 2013-09-17
8501568 Method of forming flash memory with ultraviolet treatment Vladimir Zubkov, Li-Qun Xia, Atif Noori, Reza Arghavani, Derek R. Witty +1 more 2013-08-06
8492880 Multilayered low k cap with conformal gap fill and UV stable compressive stress properties Stephan A. Cohen, Alfred Grill, Thomas J. Haigh, Jr., Son V. Nguyen, Li-Qun Xia 2013-07-23
8337950 Method for depositing boron-rich films for lithographic mask applications Victor Nguyen, Yi-Hsing Chen, Isabelita Roflox, Li-Qun Xia, Derek R. Witty 2012-12-25
8252653 Method of forming a non-volatile memory having a silicon nitride charge trap layer Vladimir Zubkov, Li-Qun Xia, Atif Noori, Reza Arghavani, Derek R. Witty +1 more 2012-08-28
8148269 Boron nitride and boron-nitride derived materials deposition method Christopher Dennis Bencher, Yongmei Chen, Li Yan Miao, Victor Nguyen, Isabelita Roflox +2 more 2012-04-03
8138104 Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ UV cure Victor Nguyen, Li-Qun Xia, Derek R. Witty, Hichem M'Saad, Mei-Yee Shek +1 more 2012-03-20
8129290 Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure Michael S. Cox, Li-Qun Xia, Mei-Yee Shek, Jia-Sheng Lee, Vladimir Zubkov +4 more 2012-03-06
8084105 Method of depositing boron nitride and boron nitride-derived materials Jeong-Uk Huh, Li-Qun Xia, Victor Nguyen, Derek R. Witty, Hichem M'Saad 2011-12-27
7923386 Method to improve the step coverage and pattern loading for dielectric films Mei-Yee Shek, Li-Qun Xia, Hichem M'Saad 2011-04-12
7910491 Gapfill improvement with low etch rate dielectric liners Young Soo Kwon, Bi Jang, Anchuan Wang, Young S. Lee, Li-Qun Xia +1 more 2011-03-22
7879683 Methods and apparatus of creating airgap in dielectric layers for the reduction of RC delay Amir Al-Bayati, Alexandros T. Demos, Kang Sub Yim, Mehul Naik, Zhenjiang Cui +2 more 2011-02-01
7871926 Methods and systems for forming at least one dielectric layer Li-Qun Xia, Victor Nguyen, Derek R. Witty, Hichem M'Saad, Haichun Yang +3 more 2011-01-18
7816205 Method of forming non-volatile memory having charge trap layer with compositional gradient Vladimir Zubkov, Li-Qun Xia, Atif Noori, Reza Arghavani, Derek R. Witty +1 more 2010-10-19
7790635 Method to increase the compressive stress of PECVD dielectric films Victor Nguyen, Li-Qun Xia, Vladimir Zubkov, Derek R. Witty, Hichem M'Saad 2010-09-07
7780865 Method to improve the step coverage and pattern loading for dielectric films Li-Qun Xia, Mei-Yee Shek, Hichem M'Saad 2010-08-24
7732342 Method to increase the compressive stress of PECVD silicon nitride films Li-Qun Xia, Vladimir Zubkov, Mei-Yee Shek, Isabelita Rolfox, Hichem M'Saad 2010-06-08
7704816 Boron derived materials deposition method Jeong-Uk Huh, Li-Qun Xia, Derek R. Witty, Hichem M'Saad 2010-04-27
7615788 Method for monolithically integrating silicon carbide microelectromechanical devices with electronic circuitry Kevin Kornegay, Andrew R. Atwell, Jon Sweat Duster, Eskinder Hailu, Ce Li 2009-11-10
7601651 Method to improve the step coverage and pattern loading for dielectric films Meiyee Shek, Li-Qun Xia, Hichem M'Saad 2009-10-13
7566655 Integration process for fabricating stressed transistor structure Jia-Sheng Lee, Mei-Yee Shek, Amir Al-Bayati, Li-Qun Xia, Hichem M'Saad 2009-07-28
7170141 Method for monolithically integrating silicon carbide microelectromechanical devices with electronic circuitry Kevin Kornegay, Andrew R. Atwell, Jon Sweat Duster, Eskinder Hailu, Ce Li 2007-01-30