MB

Mihaela Balseanu

Applied Materials: 70 patents #91 of 7,310Top 2%
CF Cornell Research Foundation: 2 patents #418 of 1,638Top 30%
IBM: 2 patents #32,839 of 70,183Top 50%
📍 Sunnyvale, CA: #176 of 14,302 inventorsTop 2%
🗺 California: #4,195 of 386,348 inventorsTop 2%
Overall (All Time): #27,397 of 4,157,543Top 1%
72
Patents All Time

Issued Patents All Time

Showing 26–50 of 72 patents

Patent #TitleCo-InventorsDate
11028478 Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors Victor Nguyen, Ning Li, Li-Qun Xia, Mark Saly, David Thompson 2021-06-08
11017997 Methods and apparatus for low temperature silicon nitride films Wenbo Yan, Cong Trinh, Ning Li, Li-Qun Xia, Maribel Maldonado-Garcia 2021-05-25
10957532 Method and apparatus for deposition of low-k films Ning Li, Zhelin Sun, Li-Qun Xia, Bhaskar Jyoti Bhuyan, Mark Saly 2021-03-23
10923396 Method of forming self-aligned via Suketu Arun Parikh 2021-02-16
10714331 Method to fabricate thermally stable low K-FinFET spacer Srinivas D. Nemani, Mei-Yee Shek, Ellie Yieh 2020-07-14
10700072 Cap layer for bit line resistance reduction Priyadarshi Panda, Jianxin Lei, Wenting Hou, Ning Li, Sanjay Natarajan +4 more 2020-06-30
10629484 Method of forming self-aligned via Suketu Arun Parikh 2020-04-21
10453678 Method and apparatus for deposition of low-k films Ning Li, Zhelin Sun, Li-Qun Xia, Bhaskar Jyoti Bhuyan, Mark Saly 2019-10-22
10319583 Selective deposition of silicon nitride films for spacer applications Ning Li, Li-Qun Xia 2019-06-11
10170298 High temperature silicon oxide atomic layer deposition technology Wenbo Yan, Cong Trinh, Ning Li, Victor Nguyen, Li-Qun Xia +1 more 2019-01-01
10147599 Methods for depositing low K and low wet etch rate dielectric thin films Ning Li, Mark Saly, David Thompson, Li-Qun Xia 2018-12-04
10134581 Methods and apparatus for selective dry etch Ning Li, Li-Qun Xia, Dongqing Yang, Anchuan Wang 2018-11-20
10023958 Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors Victor Nguyen, Ning Li, Li-Qun Xia, Mark Saly, David Thompson 2018-07-17
9984868 PEALD of films comprising silicon nitride Victor Nguyen, Woong Jae Lee, Li-Qun Xia, Derek R. Witty 2018-05-29
9875888 High temperature silicon oxide atomic layer deposition technology Wenbo Yan, Cong Trinh, Ning Li, Victor Nguyen, Li-Qun Xia +1 more 2018-01-23
9799511 Methods for depositing low k and low wet etch rate dielectric thin films Ning Li, Mark Saly, David Thompson, Li-Qun Xia 2017-10-24
9748093 Pulsed nitride encapsulation Patrick Reilly, David Alan Bethke 2017-08-29
9633861 Cu/barrier interface enhancement Weifeng YE, Mei-Yee Shek, Xiaojun Zhang, Xiaolan Ba, Yu Jin +1 more 2017-04-25
9564582 Method of forming magnetic tunneling junctions Mahendra Pakala, Jonathan Germain, Jaesoo Ahn, Lin Xue 2017-02-07
9297073 Accurate film thickness control in gap-fill technology Ning Li, Wenbo Yan, Victor Nguyen, Cong Trinh, Li-Qun Xia 2016-03-29
8758638 Copper oxide removal techniques Weifeng YE, Victor Nguyen, Mei-Yee Shek, Li-Qun Xia, Derek R. Witty 2014-06-24
8753989 Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure Michael S. Cox, Li-Qun Xia, Mei-Yee Shek, Jia-Sheng Lee, Vladimir Zubkov +4 more 2014-06-17
8598020 Plasma-enhanced chemical vapor deposition of crystalline germanium Victor Nguyen, Li-Qun Xia, Derek R. Witty 2013-12-03
8586487 Low temperature plasma enhanced chemical vapor deposition of conformal silicon carbon nitride and silicon nitride films Victor Nguyen, Li-Qun Xia, Derek R. Witty 2013-11-19
8563090 Boron film interface engineering Li-Qun Xia, Derek R. Witty, Yi-Hsing Chen 2013-10-22