Issued Patents All Time
Showing 151–175 of 196 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6656837 | Method of eliminating photoresist poisoning in damascene applications | Ping Xu, Larry Dworkin, Mehul Naik | 2003-12-02 |
| 6635575 | Methods and apparatus to enhance properties of Si-O-C low K films | Frederic Gaillard, Ellie Yieh, Tian-Hoe Lim | 2003-10-21 |
| 6632478 | Process for forming a low dielectric constant carbon-containing film | Frederic Gaillard, Jen Shu, Ellie Yieh, Tian-Hoe Lim | 2003-10-14 |
| 6627532 | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition | Frederic Gaillard, Tian-Hoe Lim, Ellie Yieh, Wai-Fan Yau, Shin-Puu Jeng +2 more | 2003-09-30 |
| 6614181 | UV radiation source for densification of CVD carbon-doped silicon oxide films | Keith Harvey, Tian-Hoe Lim | 2003-09-02 |
| 6602806 | Thermal CVD process for depositing a low dielectric constant carbon-doped silicon oxide film | Fabrice Geiger, Frederic Gaillard, Ellie Yieh, Tian-Hoe Lim | 2003-08-05 |
| 6599574 | Method and apparatus for forming a dielectric film using helium as a carrier gas | Ellie Yieh, Paul Edward Gee, Francimar Campana, Shankar Venkataranan, Dana Tribula +1 more | 2003-07-29 |
| 6596343 | Method and apparatus for processing semiconductor substrates with hydroxyl radicals | Himanshu Pokharna, Shankar Chandran, Srinivas D. Nemani, Chen-An Chen, Francimar Campana +1 more | 2003-07-22 |
| 6593247 | Method of depositing low k films using an oxidizing plasma | Tzu-Fang Huang, Yung-Cheng Lu, Ellie Yieh, Wai-Fan Yau, David Cheung +5 more | 2003-07-15 |
| 6589888 | Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers | Srinivas D. Nemani, Ellie Yieh | 2003-07-08 |
| 6583011 | Method for forming damascene dual gate for improved oxide uniformity and control | Gao Feng, Yong Meng Lee | 2003-06-24 |
| 6583497 | Surface treatment of c-doped SiO2 film to enhance film stability during O2 ashing | Tian-Hoe Lim, Frederic Gaillard, Ellie Yieh | 2003-06-24 |
| 6573196 | Method of depositing organosilicate layers | Frederick Gaillard, Tian-Hoe Lim, Ellie Yieh | 2003-06-03 |
| 6569257 | Method for cleaning a process chamber | Huong Nguyen, Michael Barnes, Ellie Yieh | 2003-05-27 |
| 6566278 | Method for densification of CVD carbon-doped silicon oxide films through UV irradiation | Keith Harvey, Tian-Hoe Lim | 2003-05-20 |
| 6531398 | Method of depositing organosillicate layers | Frederic Gaillard, Ellie Yieh, Paul Fisher, Srinivas D. Nemani | 2003-03-11 |
| 6528116 | Lid cooling mechanism and method for optimized deposition of low-k dielectric using tri methylsilane-ozone based processes | Himansu Pokharna, Tian-Hoe Lim | 2003-03-04 |
| 6514850 | Interface with dielectric layer and method of making | Huong Nguyen, Ellie Yieh, Dan Maydan | 2003-02-04 |
| 6511920 | Optical marker layer for etch endpoint determination | Huong Nguyen, Yunsang Kim, Ellie Yieh | 2003-01-28 |
| 6503843 | Multistep chamber cleaning and film deposition process using a remote plasma that also enhances film gap fill | Ellie Yieh | 2003-01-07 |
| 6500773 | Method of depositing organosilicate layers | Frederic Gaillard, Ellie Yieh | 2002-12-31 |
| 6486082 | CVD plasma assisted lower dielectric constant sicoh film | Seon-Mee Cho, Peter Wai-Man Lee, Chi-I Lang, Dian Sugiarto, Chen-An Chen +2 more | 2002-11-26 |
| 6486061 | Post-deposition treatment to enhance properties of Si-O-C low K films | Frederic Gaillard, Ellie Yieh, Tian-Hoe Lim | 2002-11-26 |
| 6472333 | Silicon carbide cap layers for low dielectric constant silicon oxide layers | Paul Fisher, Margaret Gotuaco, Frederic Gaillard, Ellie Yieh | 2002-10-29 |
| 6465366 | Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers | Srinivas D. Nemani, Ellie Yieh | 2002-10-15 |