LX

Li-Qun Xia

Applied Materials: 195 patents #8 of 7,310Top 1%
IBM: 2 patents #32,839 of 70,183Top 50%
CM Chartered Semiconductor Manufacturing: 1 patents #419 of 840Top 50%
📍 Cupertino, CA: #24 of 6,989 inventorsTop 1%
🗺 California: #578 of 386,348 inventorsTop 1%
Overall (All Time): #3,524 of 4,157,543Top 1%
196
Patents All Time

Issued Patents All Time

Showing 176–196 of 196 patents

Patent #TitleCo-InventorsDate
6465372 Surface treatment of C-doped SiO2 film to enhance film stability during O2 ashing Tian-Hoe Lim, Frederic Gaillard, Ellie Yieh 2002-10-15
6426015 Method of reducing undesired etching of insulation due to elevated boron concentrations Francimar Campana, Ellie Yieh 2002-07-30
6413583 Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound Farhad Moghadam, David Cheung, Ellie Yieh, Wai-Fan Yau, Chi-I Lang +4 more 2002-07-02
6360685 Sub-atmospheric chemical vapor deposition system with dopant bypass Ellie Yieh 2002-03-26
6352591 Methods and apparatus for shallow trench isolation Ellie Yieh, Srinivas D. Nemani 2002-03-05
6347636 Methods and apparatus for gettering fluorine from chamber material surfaces Visweswaren Sivaramakrishnan, Srinivas D. Nemani, Ellie Yieh, Gary Fong 2002-02-19
6348099 Methods and apparatus for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions Ellie Yieh, Srinivas D. Nemani 2002-02-19
6277200 Dielectric film deposition employing a bistertiarybutylaminesilane precursor Ellie Yieh 2001-08-21
6261975 Method for depositing and planarizing fluorinated BPSG films Francimar Campana, Ellie Yieh 2001-07-17
6258735 Method for using bypass lines to stabilize gas flow and maintain plasma inside a deposition chamber Tian-Hoe Lim, Huong Nguyen, Dian Sugiarto 2001-07-10
6255222 Method for removing residue from substrate processing chamber exhaust line for silicon-oxygen-carbon deposition process Himanshu Pokharrna, Tian-Hoe Lim 2001-07-03
6218268 Two-step borophosphosilicate glass deposition process and related devices and apparatus Ellie Yieh, Maria Galiano, Francimar Campana, Shankar Chandran 2001-04-17
6177344 BPSG reflow method to reduce thermal budget for next generation device including heating in a steam ambient Richard A. Conti, Maria Galiano, Ellie Yieh 2001-01-23
6153261 Dielectric film deposition employing a bistertiarybutylaminesilane precursor Ellie Yieh 2000-11-28
6114216 Methods for shallow trench isolation Ellie Yieh, Srinivas D. Nemani 2000-09-05
6099647 Methods and apparatus for forming ultra-shallow doped regions using doped silicon oxide films Ellie Yieh, Paul Edward Gee, Bang Nguyen 2000-08-08
5994209 Methods and apparatus for forming ultra-shallow doped regions using doped silicon oxide films Ellie Yieh, Paul Edward Gee, Bang Nguyen 1999-11-30
5963840 Methods for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions Ellie Yieh, Srinivas D. Nemani 1999-10-05
5935340 Method and apparatus for gettering fluorine from chamber material surfaces Visweswaren Sivaramakrishnan, Srinivas D. Nemani, Ellie Yieh, Gary Fong 1999-08-10
5862057 Method and apparatus for tuning a process recipe to target dopant concentrations in a doped layer Ellie Yieh 1999-01-19
5812403 Methods and apparatus for cleaning surfaces in a substrate processing system Gary Fong, Srinivas D. Nemani, Ellie Yieh 1998-09-22