Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7638161 | Method and apparatus for controlling dopant concentration during BPSG film deposition to reduce nitride consumption | Kevin Mukai | 2009-12-29 |
| 6814087 | Accelerated plasma clean | Scott A. Hendrickson, Gwendolyn D. Jones, Shankar Venkataraman, Ellie Yieh | 2004-11-09 |
| 6596343 | Method and apparatus for processing semiconductor substrates with hydroxyl radicals | Himanshu Pokharna, Srinivas D. Nemani, Chen-An Chen, Francimar Campana, Ellie Yieh +1 more | 2003-07-22 |
| 6514882 | Aggregate dielectric layer to reduce nitride consumption | Kevin Mukai | 2003-02-04 |
| 6218268 | Two-step borophosphosilicate glass deposition process and related devices and apparatus | Li-Qun Xia, Ellie Yieh, Maria Galiano, Francimar Campana | 2001-04-17 |
| 6170492 | Cleaning process end point determination using throttle valve position | Hiroyuki Ueda, Hirotaka Tanabe, Makoto Okubo, Ellie Yieh | 2001-01-09 |