Issued Patents All Time
Showing 51–75 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10679848 | Selective atomic layer deposition with post-dose treatment | Purushottam Kumar, Adrien LaVoie, Ishtak Karim, Frank L. Pasquale, Bart J. van Schravendijk | 2020-06-09 |
| 10665429 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Chloe Baldasseroni, Frank L. Pasquale +8 more | 2020-05-26 |
| 10651098 | Polishing with measurement prior to deposition of outer layer | Tomohiko Kitajima, Jeffrey Drue David, Taketo Sekine, Garlen C. Leung, Sidney P. Huey | 2020-05-12 |
| 10577691 | Single ALD cycle thickness control in multi-station substrate deposition systems | Romuald Nowak, Hu Kang, Adrien LaVoie | 2020-03-03 |
| 10566187 | Ultrathin atomic layer deposition film accuracy thickness control | Hu Kang, Adrien LaVoie, Seiji Matsuyama, Purushottam Kumar | 2020-02-18 |
| 10559468 | Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors | Reza Arghavani, Samantha Tan, Bhadri N. Varadarajan, Adrien LaVoie, Ananda Banerji +1 more | 2020-02-11 |
| 10526701 | Multi-cycle ALD process for film uniformity and thickness profile modulation | Purushottam Kumar, Adrien LaVoie, Hu Kang, Tuan Nguyen, Ye Wang | 2020-01-07 |
| 10526700 | Hardware and process for film uniformity improvement | Purushottam Kumar, Hu Kang, Adrien LaVoie, Yi Chung Chiu, Frank L. Pasquale +5 more | 2020-01-07 |
| 10407773 | Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system | Adrien LaVoie, Hu Kang, Purushottam Kumar, Shankar Swaminathan, Frank L. Pasquale +1 more | 2019-09-10 |
| 10374506 | Adaptive control method for zero voltage switching | Ze Zhou, Xiao-Lin Liu, Yue Shi, Zhuo Wang, Bo Zhang | 2019-08-06 |
| 10361076 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Hu Kang, Shankar Swaminathan, Wanki Kim, Dennis M. Hausmann, Bart J. van Schravendijk +1 more | 2019-07-23 |
| 10351953 | Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system | Purushottam Kumar, Adrien LaVoie, You Zhai, Jeremiah Baldwin, Sung Je Kim | 2019-07-16 |
| 10339465 | Optimized decision tree based models | Robert Matthias Steele, Tarun Agarwal, Leo Parker Dirac | 2019-07-02 |
| 10308764 | Method for preparing biobased nylon: polylactam | Liming Zhao, Jie Wei, Juan Ma, Xiaofeng Tang, Yingyang Wu +1 more | 2019-06-04 |
| 10256111 | Chemical mechanical polishing automated recipe generation | Eric Lau, King Yi Heung, Charles C. Garretson, Thomas H. Osterheld, Shuchivrat Datar +1 more | 2019-04-09 |
| 10151574 | Precision surface measurement in a vacuum | Raymond P. Conley, Mark J. Erdmann, Elina Kasman, Lahsen Assoufid, Scott J. Izzo | 2018-12-11 |
| 10100407 | Hardware and process for film uniformity improvement | Purushottam Kumar, Hu Kang, Adrien LaVoie, Yi Chung Chiu, Frank L. Pasquale +5 more | 2018-10-16 |
| 10094018 | Dynamic precursor dosing for atomic layer deposition | Purushottam Kumar, Adrien LaVoie, Hu Kang, Ishtak Karim, Fung Suong Ou | 2018-10-09 |
| 10062563 | Selective atomic layer deposition with post-dose treatment | Purushottam Kumar, Adrien LaVoie, Ishtak Karim, Frank L. Pasquale, Bart J. van Schravendijk | 2018-08-28 |
| 10037884 | Selective atomic layer deposition for gapfill using sacrificial underlayer | Fung Suong Ou, Purushottam Kumar, Adrien LaVoie, Ishtak Karim | 2018-07-31 |
| 9997357 | Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors | Reza Arghavani, Samantha Tan, Bhadri N. Varadarajan, Adrien LaVoie, Ananda Banerji +1 more | 2018-06-12 |
| 9970108 | Systems and methods for vapor delivery in a substrate processing system | Hu Kang, Purushottam Kumar, Chloe Baldasseroni, Heather Landis, Andrew Duvall +11 more | 2018-05-15 |
| 9966299 | Inhibitor plasma mediated atomic layer deposition for seamless feature fill | Wei Tang, Bart J. van Schravendijk, Hu Kang, Adrien LaVoie, Deenesh Padhi +1 more | 2018-05-08 |
| 9870917 | Variable temperature hardware and methods for reduction of wafer backside deposition | Hu Kang, Ishtak Karim, Purushottam Kumar, Ramesh Chandrasekharan, Adrien LaVoie | 2018-01-16 |
| 9811077 | Polishing with pre deposition spectrum | Tomohiko Kitajima, Jeffrey Drue David, Taketo Sekine, Garlen C. Leung, Sidney P. Huey | 2017-11-07 |