Issued Patents All Time
Showing 51–74 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9683287 | Deposition of films comprising aluminum alloys with high aluminum content | David Thompson, Srinivas Gandikota, Xinliang Lu, Wei V. Tang, Jing Zhou +6 more | 2017-06-20 |
| 9611552 | System and method for controllable non-volatile metal removal | Tsung-Liang Chen, Benjamin Schmiege, Glen Gilchrist | 2017-04-04 |
| 9580799 | Nitrogen-containing ligands and their use in atomic layer deposition methods | David Thompson | 2017-02-28 |
| 9540736 | Methods of etching films with reduced surface roughness | Benjamin Schmiege, Nitin K. Ingle, Srinivas D. Nemani, Xikun Wang, Jie Liu +1 more | 2017-01-10 |
| 9528183 | Cobalt removal for chamber clean or pre-clean process | Kai Wu, Bo Zheng, Sang Ho Yu, Avgerinos V. Gelatos, Bhushan Zope +1 more | 2016-12-27 |
| 9472417 | Plasma-free metal etch | Nitin K. Ingle, Jessica S. Kachian, Lin Xu, Soonam Park, Xikun Wang | 2016-10-18 |
| 9449843 | Selectively etching metals and metal nitrides conformally | Mikhail Korolik, Nitin K. Ingle, David Thompson, David Knapp, Benjamin Schmiege | 2016-09-20 |
| 9390940 | Methods of etching films comprising transition metals | Benjamin Schmiege, David Thompson | 2016-07-12 |
| 9328415 | Methods for the deposition of manganese-containing films using diazabutadiene-based precursors | David Thompson | 2016-05-03 |
| 9309598 | Oxide and metal removal | Xikun Wang, Jie Liu, Anchuan Wang, Nitin K. Ingle, Benjamin Schmiege | 2016-04-12 |
| 9299582 | Selective etch for metal-containing materials | Nitin K. Ingle, Jessica S. Kachian, Lin Xu, Soonam Park, Xikun Wang | 2016-03-29 |
| 9145612 | Deposition of N-metal films comprising aluminum alloys | Srinivas Gandikota, Xinliang Lu, Shih Chung Chen, Wei V. Tang, Jing Zhou +8 more | 2015-09-29 |
| 9127031 | Bisamineazaallylic ligands and their use in atomic layer deposition methods | David Thompson | 2015-09-08 |
| 9090641 | Precursors and methods for the selective deposition of cobalt and manganese on metal surfaces | — | 2015-07-28 |
| 9005704 | Methods for depositing films comprising cobalt and cobalt nitrides | David Thompson, David Knapp, Benjamin Schmiege | 2015-04-14 |
| 8993058 | Methods and apparatus for forming tantalum silicate layers on germanium or III-V semiconductor devices | Khaled Ahmed | 2015-03-31 |
| 8927059 | Deposition of metal films using alane-based precursors | Xinliang Lu, David Thompson, Mei Chang, Seshadri Ganguli, Wei V. Tang +2 more | 2015-01-06 |
| 8927438 | Methods for manufacturing high dielectric constant films | Hyungjun Kim, Woo-Hee Kim, Min-Kyu Kim, Steven C. H. Hung, Atif Noori +1 more | 2015-01-06 |
| 8906457 | Method of atomic layer deposition using metal precursors | David Thompson, Christian Dussarrat, Clément Lansalot-Matras | 2014-12-09 |
| 8821986 | Activated silicon precursors for low temperature deposition | Timothy Weidman, Todd Schroeder, David Thompson | 2014-09-02 |
| 8778816 | In situ vapor phase surface activation of SiO2 | Tatsuya Sato, David Thompson, Vladimir Zubkov, Steven Verhaverbeke, Roman Gouk +3 more | 2014-07-15 |
| 8734902 | Precursors and methods for the atomic layer deposition of manganese | David Thompson | 2014-05-27 |
| 8632853 | Use of nitrogen-containing ligands in atomic layer deposition methods | David Thompson | 2014-01-21 |
| 8481119 | Bisamineazaallylic ligands and their use in atomic layer deposition methods | David Thompson | 2013-07-09 |