Issued Patents All Time
Showing 101–125 of 251 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6815229 | In situ monitoring of sheet resistivity of silicides during rapid thermal annealing using electrical methods | Arvind Halliyal, Bhanwar Singh | 2004-11-09 |
| 6813574 | Topographically aligned layers and method for adjusting the relative alignment of layers and apparatus therefor | Sanjay K. Yedur, Bhanwar Singh, Bharath Rangarajan | 2004-11-02 |
| 6809793 | System and method to monitor reticle heating | Khoi A. Phan, Bhanwar Singh, Bharath Rangarajan | 2004-10-26 |
| 6808591 | Model based metal overetch control | Khoi A. Phan, Bharath Rangarajan, Christopher F. Lyons, Steven C. Avanzino, Bhanwar Singh +1 more | 2004-10-26 |
| 6803178 | Two mask photoresist exposure pattern for dense and isolated regions | Scott A. Bell, Todd P. Lukanc, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eli Kim | 2004-10-12 |
| 6803267 | Silicon containing material for patterning polymeric memory element | Christopher F. Lyons, Matthew S. Buynoski, Patrick K. Cheung, Angela T. Hui, Ashok M. Khathuria +5 more | 2004-10-12 |
| 6787458 | Polymer memory device formed in via opening | Nicholas H. Tripsas, Matthew S. Buynoski, Suzette K. Pangrle, Uzodinma Okoroanyanwu, Angela T. Hui +7 more | 2004-09-07 |
| 6773954 | Methods of forming passive layers in organic memory cells | Jane V. Oglesby, Sergey Lopatin, Mark S. Chang, Christopher F. Lyons, James J. Xie +1 more | 2004-08-10 |
| 6771374 | Scatterometry based measurements of a rotating substrate | Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton | 2004-08-03 |
| 6771356 | Scatterometry of grating structures to monitor wafer stress | Christopher F. Lyons, Bhanwar Singh, Steven C. Avanzino, Khoi A. Phan, Bharath Rangarajan +1 more | 2004-08-03 |
| 6762133 | System and method for control of hardmask etch to prevent pattern collapse of ultra-thin resists | Bharath Rangarajan, Khoi A. Phan | 2004-07-13 |
| 6758612 | System and method for developer endpoint detection by reflectometry or scatterometry | Cyrus E. Tabery, Bharath Rangarajan, Bhanwar Singh | 2004-07-06 |
| 6753266 | Method of enhancing gate patterning properties with reflective hard mask | Todd P. Lukanc, Scott A. Bell, Christopher F. Lyons, Marina V. Plat | 2004-06-22 |
| 6753247 | Method(s) facilitating formation of memory cell(s) and patterned conductive | Uzodinma Okoroanyanwu, Suzette K. Pangrle, Matthew S. Buynoski, Nicholas H. Tripsas, Mark S. Chang +1 more | 2004-06-22 |
| 6746973 | Effect of substrate surface treatment on 193 NM resist processing | Catherine B. Labelle, Ernesto A. Gallardo, Jacques Bertrand | 2004-06-08 |
| 6741445 | Method and system to monitor and control electro-static discharge | Khoi A. Phan, Bhanwar Singh, Bharath Rangarajan | 2004-05-25 |
| 6737222 | Dual damascene process utilizing a bi-layer imaging layer | Christopher F. Lyons, Marina V. Plat, Scott A. Bell | 2004-05-18 |
| 6727995 | Gate oxide thickness measurement and control using scatterometry | Arvind Halliyal, Bhanwar Singh | 2004-04-27 |
| 6721046 | Monitoring of concentration of nitrogen in nitrided gate oxides, and gate oxide interfaces | Arvind Halliyal, Bhanwar Singh | 2004-04-13 |
| 6704101 | Scatterometry based measurements of a moving substrate | Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton | 2004-03-09 |
| 6702648 | Use of scatterometry/reflectometry to measure thin film delamination during CMP | Steven C. Avanzino, Bhanwar Singh, Bharath Rangarajan | 2004-03-09 |
| 6689541 | Process for forming a photoresist mask | Scott A. Bell, Todd P. Lukanc, Christopher F. Lyons, Marina V. Plat | 2004-02-10 |
| 6686270 | Dual damascene trench depth monitoring | Christopher F. Lyons | 2004-02-03 |
| 6685467 | System using hot and cold fluids to heat and cool plate | — | 2004-02-03 |
| 6684172 | Sensor to predict void free films using various grating structures and characterize fill performance | Steven C. Avanzino, Christopher F. Lyons, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh +1 more | 2004-01-27 |