Issued Patents All Time
Showing 51–75 of 251 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7235414 | Using scatterometry to verify contact hole opening during tapered bilayer etch | Calvin T. Gabriel, Bhanwar Singh | 2007-06-26 |
| 7224456 | In-situ defect monitor and control system for immersion medium in immersion lithography | Khoi A. Phan, Bhanwar Singh, Bharath Rangarajan | 2007-05-29 |
| 7221060 | Composite alignment mark scheme for multi-layers in lithography | Bhanwar Singh, Khoi A. Phan, Bharath Rangarajan, Iraj Emami | 2007-05-22 |
| 7187796 | Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabrication | Khoi A. Phan, Bhanwar Singh | 2007-03-06 |
| 7156925 | Using supercritical fluids to clean lenses and monitor defects | Bhanwar Singh, Khoi A. Phan, Srikanteswara Dakshina-Murthy | 2007-01-02 |
| 7158896 | Real time immersion medium control using scatterometry | Bhanwar Singh, Srikanteswara Dakshina-Murthy, Khoi A. Phan, Bharath Rangarajan, Iraj Emami | 2007-01-02 |
| 7153364 | Re-circulation and reuse of dummy-dispensed resist | Bharath Rangarajan, Khoi A. Phan, Ursula Q. Quinto, Michael K. Templeton | 2006-12-26 |
| 7115440 | SO2 treatment of oxidized CuO for copper sulfide formation of memory element growth | Christopher F. Lyons, Sergey Lopatin, James J. Xie, Angela T. Hui | 2006-10-03 |
| 7109046 | Surface oxide tabulation and photo process control and cost savings | Bhanwar Singh, Khoi A. Phan | 2006-09-19 |
| 7084988 | System and method for creation of semiconductor multi-sloped features | Bharath Rangarajan, Bhanwar Singh | 2006-08-01 |
| 7079975 | Scatterometry and acoustic based active control of thin film deposition process | Arvind Halliyal, Bhanwar Singh | 2006-07-18 |
| 7078348 | Dual layer patterning scheme to make dual damascene | Bhanwar Singh, Bharath Rangarajan, Michael K. Templeton | 2006-07-18 |
| 7076320 | Scatterometry monitor in cluster process tool environment for advanced process control (APC) | Khoi A. Phan, Bhanwar Singh | 2006-07-11 |
| 7065427 | Optical monitoring and control of two layers of liquid immersion media | Srikanteswara Dakshina-Murthy, Bhanwar Singh, Bharath Rangarajan, Khoi A. Phan | 2006-06-20 |
| 7064846 | Non-lithographic shrink techniques for improving line edge roughness and using imperfect (but simpler) BARCs | Gilles Amblard, Bhanwar Singh, Khoi A. Phan | 2006-06-20 |
| 7056804 | Shallow trench isolation polish stop layer for reduced topography | Christopher F. Lyons | 2006-06-06 |
| 7052921 | System and method using in situ scatterometry to detect photoresist pattern integrity during the photolithography process | Marina V. Plat, Bhanwar Singh, Calvin T. Gabriel, Christopher F. Lyons, Scott A. Bell +1 more | 2006-05-30 |
| 7052575 | System and method for active control of etch process | Bharath Rangarajan, Bhanwar Singh | 2006-05-30 |
| 7034930 | System and method for defect identification and location using an optical indicia device | Khoi A. Phan, Bharath Rangarajan | 2006-04-25 |
| 7018922 | Patterning for elongated VSS contact flash memory | Hung-Eil Kim, Anna M. Minvielle, Christopher F. Lyons, Marina V. Plat | 2006-03-28 |
| 7015504 | Sidewall formation for high density polymer memory element array | Christopher F. Lyons, Mark S. Chang, Sergey Lopatin, Patrick K. Cheung, Minh Van Ngo +1 more | 2006-03-21 |
| 7011762 | Metal bridging monitor for etch and CMP endpoint detection | Christopher F. Lyons, Steven C. Avanzino | 2006-03-14 |
| 7008832 | Damascene process for a T-shaped gate electrode | Christopher F. Lyons, Marina V. Plat, Bhanwar Singh | 2006-03-07 |
| 6999254 | Refractive index system monitor and control for immersion lithography | Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh | 2006-02-14 |
| 6982043 | Scatterometry with grating to observe resist removal rate during etch | Bharath Rangarajan, Catherine B. Labelle, Bhanwar Singh, Christopher F. Lyons | 2006-01-03 |