Issued Patents All Time
Showing 26–50 of 251 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8170787 | Vehicle collision avoidance system | Robert Martin Coats, David Robert Pavlik, David James Edwards | 2012-05-01 |
| 8099205 | Machine guidance system | Robert Martin Coats, Michael Sean McDaniel, David James Edwards, Kenneth L. Stratton | 2012-01-17 |
| 8007631 | System and method for imprint lithography to facilitate dual damascene integration with two imprint acts | Srikanteswara Dakshina-Murthy, Bhanwar Singh | 2011-08-30 |
| 7943289 | Inverse resist coating process | Bharath Rangarajan, Michael K. Templeton | 2011-05-17 |
| 7799514 | Surface treatment with an acidic composition to prevent substrate and environmental contamination | Bhanwar Singh, Gilles Amblard | 2010-09-21 |
| 7604903 | Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) | Bhanwar Singh, Srikanteswara Dakshina-Murthy, Khoi A. Phan, Bharath Rangarajan | 2009-10-20 |
| 7591902 | Recirculation and reuse of dummy dispensed resist | Bharath Rangarajan, Khoi A. Phan, Ursula Q. Quinto, Michael Templeton | 2009-09-22 |
| 7554522 | Personalization of user accessibility options | Robert Sinclair, Gilma Perkins, Michael Winser, Paul J. Reid | 2009-06-30 |
| 7465953 | Positioning of nanoparticles and fabrication of single election devices | Seong Jin Koh, Choong-Un Kim, Liang Ma | 2008-12-16 |
| 7449348 | Feedback control of imprint mask feature profile using scatterometry and spacer etchback | Srikanteswara Dakshina-Murthy, Bhanwar Singh, Khoi A. Phan | 2008-11-11 |
| 7386162 | Post fabrication CD modification on imprint lithography mask | Srikanteswara Dakshina-Murthy, Bhanwar Singh | 2008-06-10 |
| 7384569 | Imprint lithography mask trimming for imprint mask using etch | Srikanteswara Dakshina-Murthy, Bhanwar Singh | 2008-06-10 |
| 7381278 | Using supercritical fluids to clean lenses and monitor defects | Bhanwar Singh, Khoi A. Phan, Srikanteswara Dakshina-Murthy | 2008-06-03 |
| 7376259 | Topography compensation of imprint lithography patterning | Srikanteswara Dakshina-Murthy, Bhanwar Singh | 2008-05-20 |
| 7374654 | Method of making an organic memory cell | Mark S. Chang, Sergey Lopatin | 2008-05-20 |
| 7368225 | Two mask photoresist exposure pattern for dense and isolated regions | Scott A. Bell, Todd P. Lukanc, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eil Kim | 2008-05-06 |
| 7310155 | Extraction of tool independent line-edge-roughness (LER) measurements using in-line programmed LER and reliability structures | Luigi Capodieci, Amit P. Marathe, Bhanwar Singh | 2007-12-18 |
| 7309659 | Silicon-containing resist to pattern organic low k-dielectrics | Calvin T. Gabriel, Bhanwar Singh | 2007-12-18 |
| 7305645 | Method for manufacturing place & route based on 2-D forbidden patterns | Luigi Capodieci, Bhanwar Singh | 2007-12-04 |
| 7295288 | Systems and methods of imprint lithography with adjustable mask | Bhanwar Singh, Khoi A. Phan | 2007-11-13 |
| 7289193 | Frame structure for turbulence control in immersion lithography | Bhanwar Singh, Khoi A. Phan | 2007-10-30 |
| 7262422 | Use of supercritical fluid to dry wafer and clean lens in immersion lithography | Bhanwar Singh, Khoi A. Phan | 2007-08-28 |
| 7262138 | Organic BARC with adjustable etch rate | Bhanwar Singh, Gilles Amblard | 2007-08-28 |
| 7251033 | In-situ reticle contamination detection system at exposure wavelength | Khoi A. Phan, Bhanwar Singh, Bharath Rangarajan | 2007-07-31 |
| 7235474 | System and method for imprint lithography to facilitate dual damascene integration with two imprint acts | Srikanteswara Dakshina-Murthy, Bhanwar Singh | 2007-06-26 |