Issued Patents All Time
Showing 76–100 of 251 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6972201 | Using scatterometry to detect and control undercut for ARC with developable BARCs | Bhanwar Singh, Khoi A. Phan | 2005-12-06 |
| 6954678 | Artificial intelligence system for track defect problem solving | Khoi A. Phan, Bhanwar Singh, Bharath Rangarajan | 2005-10-11 |
| 6936545 | Organic memory cell formation on Ag substrate | James J. Xie | 2005-08-30 |
| 6934032 | Copper oxide monitoring by scatterometry/ellipsometry during nitride or BLOK removal in damascene process | Steven C. Avanzino, Bharath Rangarajan, Bhanwar Singh | 2005-08-23 |
| 6931618 | Feed forward process control using scatterometry for reticle fabrication | Cyrus E. Tabery, Bharath Rangarajan, Bhanwar Singh | 2005-08-16 |
| 6915177 | Comprehensive integrated lithographic process control system based on product design and yield feedback system | Khoi A. Phan, Bhanwar Singh, Bharath Rangarajan | 2005-07-05 |
| 6912438 | Using scatterometry to obtain measurements of in circuit structures | Bryan K. Choo, Bhanwar Singh, Bharath Rangarajan | 2005-06-28 |
| 6905950 | Growing copper vias or lines within a patterned resist using a copper seed layer | Michael K. Templeton, Bhanwar Singh, Bharath Rangarajan | 2005-06-14 |
| 6900124 | Patterning for elliptical Vss contact on flash memory | Hung-Eil Kim, Anna M. Minvielle, Christopher F. Lyons, Marina V. Plat | 2005-05-31 |
| 6889763 | System for rapidly and uniformly cooling resist | Bharath Rangarajan, Michael K. Templeton | 2005-05-10 |
| 6878961 | Photosensitive polymeric memory elements | Christopher F. Lyons, Mark S. Chang | 2005-04-12 |
| 6879406 | Use of scatterometry as a control tool in the manufacture of extreme UV masks | Bharath Rangarajan, Bhanwar Singh | 2005-04-12 |
| 6879051 | Systems and methods to determine seed layer thickness of trench sidewalls | Bhanwar Singh, Michael K. Templeton, Bharath Rangarajan | 2005-04-12 |
| 6878622 | Method for forming SAC using a dielectric as a BARC and FICD enlarger | Wenge Yang, Fei Wang, Lewis Shen | 2005-04-12 |
| 6878560 | Fab correlation system | Bharath Rangarajan, Bhanwar Singh | 2005-04-12 |
| 6869888 | E-beam flood exposure of spin-on material to eliminate voids in vias | Marina V. Plat, Christopher F. Lyons, Bhanwar Singh | 2005-03-22 |
| 6849469 | Monitor and control of silicidation using fourier transform infrared scatterometry | Ciby Thuruthiyil, Bhanwar Singh | 2005-02-01 |
| 6846749 | N-containing plasma etch process with reduced resist poisoning | Calvin T. Gabriel, Lynne A. Okada | 2005-01-25 |
| 6845345 | System for monitoring and analyzing diagnostic data of spin tracks | Bhanwar Singh, Michael K. Templeton | 2005-01-18 |
| 6844206 | Refractive index system monitor and control for immersion lithography | Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh | 2005-01-18 |
| 6836398 | System and method of forming a passive layer by a CMP process | Jane V. Oglesby, Minh Van Ngo, Mark S. Chang, Sergey Lopatin, Angela T. Hui +3 more | 2004-12-28 |
| 6828162 | System and method for active control of BPSG deposition | Arvind Halliyal, Bhanwar Singh, Michael K. Templeton | 2004-12-07 |
| 6829040 | Lithography contrast enhancement technique by varying focus with wavelength modulation | Jongwook Kye, Ivan Lalovic, Christopher F. Lyons | 2004-12-07 |
| 6825060 | Photosensitive polymeric memory elements | Christopher F. Lyons, Mark S. Chang | 2004-11-30 |
| 6819427 | Apparatus of monitoring and optimizing the development of a photoresist material | Michael K. Templeton, Bharath Rangarajan | 2004-11-16 |