Issued Patents 2020
Showing 1–25 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879108 | Topographic planarization method for lithography process | Tzu-Yang Lin, Ming-Hui Weng, Cheng-Han Wu | 2020-12-29 |
| 10872773 | Methods of reducing pattern roughness in semiconductor fabrication | Chien-Wei Wang, Joy Cheng, Ching-Yu Chang | 2020-12-22 |
| 10871713 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2020-12-22 |
| 10866515 | Lithography process using photoresist material with photosensitive functional group | Ming-Hui Weng, Cheng-Han Wu, Ching-Yu Chang, Siao-Shan Wang | 2020-12-15 |
| 10866504 | Lithography mask with a black border region and method of fabricating the same | Chien-Cheng Chen, Hsin-Chang Lee, Chia-Jen Chen, Pei-Cheng Hsu, Yih-Chen Su +2 more | 2020-12-15 |
| 10866511 | Extreme ultraviolet photolithography method with developer composition | An-Ren Zi, Joy Cheng, Ching-Yu Chang | 2020-12-15 |
| 10866525 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Shinn-Sheng Yu, Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen +1 more | 2020-12-15 |
| 10866517 | Lithography techniques for reducing resist swelling | Ming-Hui Weng, Cheng-Han Wu, Ching-Yu Chang | 2020-12-15 |
| 10863630 | Material composition and methods thereof | Siao-Shan Wang, Cheng-Han Wu, Ching-Yu Chang | 2020-12-08 |
| 10859915 | Adhesion layer for multi-layer photoresist | Chen-Yu Liu, Tzu-Yang Lin, Ya-Ching Chang, Ching-Yu Chang | 2020-12-08 |
| 10857649 | Method and apparatus for performing a polishing process in semiconductor fabrication | Bo-I Lee, Huang Soon Kang, Chi-Ming Yang | 2020-12-08 |
| 10840102 | Integrated system, integrated system operation method and film treatment method | Weibo Yu, Wen-Yu Ku, Kuo-Sheng Chuang | 2020-11-17 |
| 10802402 | Material composition and process for substrate modification | Wei-Han Lai, Chien-Wei Wang, Ching-Yu Chang | 2020-10-13 |
| 10796910 | Method for performing a photolithography process | Tsung-Han Ko, Joy Cheng, Ching-Yu Chang | 2020-10-06 |
| 10790155 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chih-Ming Lai, Wei-Liang Lin, Yung-Sung Yen, Ken-Hsien Hsieh | 2020-09-29 |
| 10787742 | Control system for plasma chamber having controllable valve and method of using the same | Yen-Shuo Su, Ying Xiao | 2020-09-29 |
| 10777681 | Multi-layer photoresist | An-Ren Zi, Ching-Yu Chang | 2020-09-15 |
| 10768527 | Resist solvents for photolithography applications | Yu-Chung Su, Kuan-Hsin Lo, Yahru Cheng, Ching-Yu Chang | 2020-09-08 |
| 10747114 | Blocking layer material composition and methods thereof in semiconductor manufacturing | Siao-Shan Wang, Chen-Yu Liu, Ching-Yu Chang | 2020-08-18 |
| 10747103 | Pellicle fabrication methods and structures thereof | Yun-Yue Lin, Hsuan-Chen Chen, Chih-Cheng Lin, Hsin-Chang Lee, Yao-Ching Ku +3 more | 2020-08-18 |
| 10741391 | Method for forming semiconductor structure by patterning resist layer having inorganic material | An-Ren Zi, Ching-Yu Chang | 2020-08-11 |
| 10720419 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2020-07-21 |
| 10714620 | FinFETs and methods of forming FinFETs | Tai-Chun Huang, Tien-I Bao | 2020-07-14 |
| 10712651 | Method and apparatus for collecting information used in image-error compensation | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2020-07-14 |
| 10707081 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2020-07-07 |