Issued Patents 2020
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10880981 | Collector pellicle | Shang-Chieh Chien, Chi-Ming Yang, Jen-Yang Chung, Shao-Wei Luo, Tzung-Chi Fu +2 more | 2020-12-29 |
| 10871713 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-12-22 |
| 10861790 | Power strap structure for high performance and low current density | Chih-Liang Chen, Chih-Ming Lai, Charles Chew-Yuen Young, Chi-Yeh Yu, Jiann-Tyng Tzeng +6 more | 2020-12-08 |
| 10833061 | Semiconductor device including source/drain contact having height below gate stack | Charles Chew-Yuen Young, Chih-Liang Chen, Chih-Ming Lai, Jiann-Tyng Tzeng, Shun Li Chen +3 more | 2020-11-10 |
| 10818509 | Method of fabricating semiconductor device with reduced trench distortions | Yung-Sung Yen, Chung-Ju Lee, Chia-Tien Wu, Ta-Ching Yu, Kuei-Shun Chen +4 more | 2020-10-27 |
| 10784168 | Dummy MOL removal for performance enhancement | Hui-Ting Yang, Chih-Ming Lai, Chih-Liang Chen, Charles Chew-Yuen Young, Jiann-Tyng Tzeng +4 more | 2020-09-22 |
| 10763113 | Lithographic technique for feature cut by line-end shrink | Yung-Sung Yen, Ko-Bin Kao, Ken-Hsien Hsieh, Ru-Gun Liu | 2020-09-01 |
| 10720419 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-07-21 |
| 10714357 | Methods for improved critical dimension uniformity in a semiconductor device fabrication process | Chi-Cheng Hung, De-Fang Chen, Wei-Liang Lin, Yu-Tien Shen | 2020-07-14 |
| 10712651 | Method and apparatus for collecting information used in image-error compensation | Hung-Wen Cho, Fu-Jye Liang, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-07-14 |
| 10665585 | Structure and method for alignment marks | Ming-Chang Wen, Hsien-Cheng Wang | 2020-05-26 |
| 10642158 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-05-05 |