Issued Patents 2020
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10861698 | Pattern fidelity enhancement | Yu-Tien Shen, Ya-Wen Yeh, Ya Hui Chang, Yung-Sung Yen, Wei-Hao Wu +3 more | 2020-12-08 |
| 10790155 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chih-Ming Lai, Yung-Sung Yen, Ken-Hsien Hsieh, Chin-Hsiang Lin | 2020-09-29 |
| 10741262 | NAND flash operating techniques mitigating program disturbance | Chun-Chang Lu, Wen-Jer Tsai, Guan-Wei Wu, Yao-Wen Chang | 2020-08-11 |
| 10714357 | Methods for improved critical dimension uniformity in a semiconductor device fabrication process | Chi-Cheng Hung, Chun-Kuang Chen, De-Fang Chen, Yu-Tien Shen | 2020-07-14 |
| 10714485 | Semiconductor device which includes Fins | Chih-Liang Chen, Chih-Ming Lai, Charles Chew-Yuen Young, Chin-Yuan Tseng, Jiann-Tyng Tzeng +3 more | 2020-07-14 |
| 10707081 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2020-07-07 |
| 10692725 | Directed self-assembly process with size-restricted guiding patterns | Ming-Huei Weng, Kuan-Hsin Lo, Chi-Cheng Hung | 2020-06-23 |
| 10658184 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Ching-Yu Chang +7 more | 2020-05-19 |
| 10535520 | Fin patterning methods for increased process margins | Chin-Yuan Tseng, Li-Te Lin, Ru-Gun Liu, Min Cao | 2020-01-14 |