Issued Patents 2020
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879078 | Method of patterning resist layer and method of forming semiconductor structure using patterned resist layer | Li-Po YANG, Ching-Yu Chang | 2020-12-29 |
| 10872773 | Methods of reducing pattern roughness in semiconductor fabrication | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-22 |
| 10802402 | Material composition and process for substrate modification | Wei-Han Lai, Ching-Yu Chang, Chin-Hsiang Lin | 2020-10-13 |
| 10658184 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Ching-Yu Chang, Chih-Yuan Ting +7 more | 2020-05-19 |