Issued Patents 2020
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10872773 | Methods of reducing pattern roughness in semiconductor fabrication | Chien-Wei Wang, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-22 |
| 10866511 | Extreme ultraviolet photolithography method with developer composition | An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-15 |
| 10866516 | Metal-compound-removing solvent and method in lithography | An-Ren Zi, Ching-Yu Chang | 2020-12-15 |
| 10796910 | Method for performing a photolithography process | Tsung-Han Ko, Ching-Yu Chang, Chin-Hsiang Lin | 2020-10-06 |
| 10741410 | Material composition and methods thereof | An-Ren Zi, Ching-Yu Chang | 2020-08-11 |
| 10635000 | Semiconductor method of protecting wafer from bevel contamination | An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin | 2020-04-28 |
| 10622211 | Metal-compound-removing solvent and method in lithography | An-Ren Zi, Ching-Yu Chang | 2020-04-14 |
| 10573519 | Method for performing a photolithography process | Tsung-Han Ko, Ching-Yu Chang, Chin-Hsiang Lin | 2020-02-25 |