Issued Patents 2020
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10866516 | Metal-compound-removing solvent and method in lithography | Joy Cheng, Ching-Yu Chang | 2020-12-15 |
| 10866511 | Extreme ultraviolet photolithography method with developer composition | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-15 |
| 10838304 | Priming material for organometallic resist | Chun-Chih HO, Ching-Yu Chang | 2020-11-17 |
| 10777681 | Multi-layer photoresist | Ching-Yu Chang, Chin-Hsiang Lin | 2020-09-15 |
| 10741410 | Material composition and methods thereof | Joy Cheng, Ching-Yu Chang | 2020-08-11 |
| 10741391 | Method for forming semiconductor structure by patterning resist layer having inorganic material | Chin-Hsiang Lin, Ching-Yu Chang | 2020-08-11 |
| 10698317 | Underlayer material for photoresist | Wei-Han Lai, Ching-Yu Chang | 2020-06-30 |
| 10684545 | Method for forming semiconductor structure by patterning assist layer having polymer | Ching-Yu Chang, Chin-Hsiang Lin | 2020-06-16 |
| 10635000 | Semiconductor method of protecting wafer from bevel contamination | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2020-04-28 |
| 10622211 | Metal-compound-removing solvent and method in lithography | Joy Cheng, Ching-Yu Chang | 2020-04-14 |