Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10768527 | Resist solvents for photolithography applications | Yu-Chung Su, Yahru Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2020-09-08 |
| 10739673 | Preparing patterned neutral layers and structures prepared using the same | Ching-Yu Chang | 2020-08-11 |
| 10692725 | Directed self-assembly process with size-restricted guiding patterns | Ming-Huei Weng, Wei-Liang Lin, Chi-Cheng Hung | 2020-06-23 |