Issued Patents 2020
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10861953 | Air spacers in transistors and methods forming same | Yi-Lun Chen, Chao-Hsien Huang, Chun-Hsiung Lin | 2020-12-08 |
| 10861745 | Semiconductor device and method of manufacture | Chan Syun David Yang, Chun-Jui Huang | 2020-12-08 |
| 10861706 | Etch selectivity improved by laser beam | Christine Y Ouyang | 2020-12-08 |
| 10861698 | Pattern fidelity enhancement | Yu-Tien Shen, Ya-Wen Yeh, Wei-Liang Lin, Ya Hui Chang, Yung-Sung Yen +3 more | 2020-12-08 |
| 10847633 | Method for forming semiconductor device | Yi-Ruei Jhan, Yi-Lun Chen, Fang-Wei Lee, Han-Yu Lin, Pinyen Lin | 2020-11-24 |
| 10790195 | Elongated pattern and formation thereof | Po-Chin Chang, Pinyen Lin | 2020-09-29 |
| 10777455 | Multi-etching process for forming via opening in semiconductor device structure | Chun-Jui Huang, Pinyen Lin | 2020-09-15 |
| 10755943 | Method for manufacturing semiconductor device | Jung-Hao Chang, Chao-Hsien Huang, Wen-Ting Lan, Shi Ning Ju, Kuo-Cheng Ching | 2020-08-25 |
| 10755968 | Method of forming semiconductor structure having layer with re-entrant profile | Yi-Shan Chen, Chan Syun David Yang, Pinyen Lin | 2020-08-25 |
| 10741671 | Method for manufacturing semiconductor device | Yi-Chen Lo, Pinyen Lin | 2020-08-11 |
| 10707081 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2020-07-07 |
| 10680109 | CMOS semiconductor device having fins and method of fabricating the same | Shu-Hao Kuo, Jung-Hao Chang, Chao-Hsien Huang, Kuo-Cheng Ching | 2020-06-09 |
| 10645650 | Computer power saving method and computer waking method | Ko-Hui Lin, Yi-Ming Teng | 2020-05-05 |
| 10535520 | Fin patterning methods for increased process margins | Chin-Yuan Tseng, Wei-Liang Lin, Ru-Gun Liu, Min Cao | 2020-01-14 |