Issued Patents 2020
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10871713 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-12-22 |
| 10852649 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Po-Chung Cheng, Li-Jui Chen, Shih-Chang Shih | 2020-12-01 |
| 10831094 | Pellicle for EUV mask and fabrication thereof | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2020-11-10 |
| 10824080 | Method to reduce native defect printability | Tsung-Chih Chien, Tsung Chuan Lee | 2020-11-03 |
| 10756016 | Interconnection structure and methods of fabrication the same | Shih-Ming Chang | 2020-08-25 |
| 10747097 | Mask with multilayer structure and manufacturing method by using the same | Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2020-08-18 |
| 10720419 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-07-21 |
| 10712651 | Method and apparatus for collecting information used in image-error compensation | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-07-14 |
| 10642158 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-05-05 |
| 10642148 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Ching-Wei Shen, Jeng-Horng Chen | 2020-05-05 |
| 10534279 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Po-Chung Cheng, Li-Jui Chen, Shih-Chang Shih | 2020-01-14 |