Issued Patents 2020
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10831094 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2020-11-10 |
| 10825684 | Material composition and methods thereof | Shu-Hao Chang, Chien-Chih Chen, Kuo-Chang Kau, Pi-Yeh Chia, Chi-Ren Chen +1 more | 2020-11-03 |
| 10747097 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2020-08-18 |
| 10691014 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2020-06-23 |
| 10685846 | Semiconductor integrated circuit fabrication with pattern-reversing process | Ming-Chin Chien, Jui-Ching Wu, Shu-Hao Chang, Shang-Chieh Chien, Jen-Yang Chung +1 more | 2020-06-16 |
| 10684552 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Anthony Yen | 2020-06-16 |
| 10642148 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Chih-Tsung Shih, Ching-Wei Shen | 2020-05-05 |
| 10534256 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Ta-Cheng Lien, Hsin-Chang Lee, Chih-Cheng Lin | 2020-01-14 |