Issued Patents 2020
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10871721 | Mask blank for lithography and method of manufacturing the same | Ming-Wei Chen, Ping-Hsun Lin | 2020-12-22 |
| 10866504 | Lithography mask with a black border region and method of fabricating the same | Chin-Hsiang Lin, Chien-Cheng Chen, Chia-Jen Chen, Pei-Cheng Hsu, Yih-Chen Su +2 more | 2020-12-15 |
| 10859906 | Extreme ultraviolet alignment marks | Yi-Fu Hsieh, Chih-Chiang Tu, Jong-Yuh Chang | 2020-12-08 |
| 10816892 | Method of manufacturing photo masks | Chien-Cheng Chen, Chia-Jen Chen, Shih-Ming Chang, Tran-Hui Shen, Yen-Cheng HO +1 more | 2020-10-27 |
| 10747103 | Pellicle fabrication methods and structures thereof | Yun-Yue Lin, Hsuan-Chen Chen, Chih-Cheng Lin, Yao-Ching Ku, Wei-Jen Lo +3 more | 2020-08-18 |
| 10670959 | Pellicle and method of using the same | Chue-San Yoo, Pei-Cheng Hsu, Yun-Yue Lin | 2020-06-02 |
| 10534256 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Ta-Cheng Lien, Chih-Cheng Lin, Jeng-Horng Chen | 2020-01-14 |