Issued Patents 2020
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10872969 | Semiconductor device with combined fin-edge-cut and fin-major-cut and method of manufacturing the same | — | 2020-12-22 |
| 10845699 | Method for forming photomask and photolithography method | Minfeng Chen, Min-An Yang, Shao-Chi Wei | 2020-11-24 |
| 10816892 | Method of manufacturing photo masks | Chien-Cheng Chen, Chia-Jen Chen, Hsin-Chang Lee, Tran-Hui Shen, Yen-Cheng HO +1 more | 2020-10-27 |
| 10770303 | Mechanisms for forming patterns using multiple lithography processes | Ming-Feng Shieh, Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau | 2020-09-08 |
| 10756016 | Interconnection structure and methods of fabrication the same | Chih-Tsung Shih | 2020-08-25 |
| 10734321 | Integrated circuit and method of manufacturing same | Pochun Wang, Ting-Wei Chiang, Chih-Ming Lai, Hui-Zhong Zhuang, Jung-Chan Yang +6 more | 2020-08-04 |
| 10698320 | Method for optimized wafer process simulation | Ru-Gun Liu, Shuo-Yen Chou, Zengqin Zhao, Chien-Wen Lai | 2020-06-30 |
| 10678142 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Chih-Jie Lee, Shuo-Yen Chou, Ru-Gun Liu | 2020-06-09 |
| 10665467 | Spacer etching process for integrated circuit design | Ru-Gun Liu, Cheng-Hsiung Tsai, Chung-Ju Lee, Chih-Ming Lai, Chia-Ying Lee +6 more | 2020-05-26 |
| 10535646 | Systems and methods for a sequential spacer scheme | Ming-Feng Shieh, Ru-Gun Liu, Tsai-Sheng Gau | 2020-01-14 |
| 10528693 | Layout optimization of a main pattern and a cut pattern | Kuei-Liang Lu | 2020-01-07 |