Issued Patents 2020
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10875060 | Method and apparatus for removing debris from collector | Shang-Ying WU, Ming-Hsun Tsai, Sheng-Kang Yu, Yung-Teng Yu, Chi-Ming Yang +3 more | 2020-12-29 |
| 10880981 | Collector pellicle | Shang-Chieh Chien, Chi-Ming Yang, Jen-Yang Chung, Shao-Wei Luo, Tzung-Chi Fu +2 more | 2020-12-29 |
| 10880980 | EUV light source and apparatus for EUV lithography | Wei-Shin Cheng, Han-Lung Chang, Po-Chung Cheng, Hsiao-Lun Chang | 2020-12-29 |
| 10877378 | Vessel for extreme ultraviolet radiation source | Ssu-Yu Chen, Che-Chang Hsu, Chi-Ming Yang, Shang-Chieh Chien, Po-Chung Cheng | 2020-12-29 |
| 10877366 | Pressurized tin collection bucket with in-line draining mechanism | Chi-Ming Yang, Hsin-Feng Chen | 2020-12-29 |
| 10877190 | Extreme ultraviolet radiation source | Chi-Ming Yang, Sheng-Ta Lin, Jen-Yang Chung, Shang-Chieh Chien, Po-Chung Cheng | 2020-12-29 |
| 10871713 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Po-Chung Cheng +1 more | 2020-12-22 |
| 10871719 | EUV metal droplet catchers | Sheng-Ta Lin, Po-Chung Cheng, Shang-Chieh Chien | 2020-12-22 |
| 10871647 | Apparatus and method for prevention of contamination on collector of extreme ultraviolet light source | Kuo-An Liu, Gwan Sin Chang, Bharath Kumar Pulicherla, Sheng-Kang Yu, Chung-Cheng Wu +1 more | 2020-12-22 |
| 10859928 | EUV light source and apparatus for lithography | Yu-Chih Chen, Sheng-Kang Yu, Chi-Ming Yang, Shang-Chieh Chien, Po-Chung Cheng | 2020-12-08 |
| 10859918 | Semiconductor apparatus and method of operating the same | Kuan-Hung Chen, Chieh Hsieh, Shang-Chieh Chien, Po-Chung Cheng | 2020-12-08 |
| 10852649 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Po-Chung Cheng, Chih-Tsung Shih, Shih-Chang Shih | 2020-12-01 |
| 10852191 | Light source system and polarization angle adjusting method | Jen-Hao Yeh, Chun-Lin Chang, Han-Lung Chang, Po-Chung Cheng | 2020-12-01 |
| 10842009 | System and method for extreme ultraviolet source control | Chun-Chia Hsu, Chieh Hsieh, Shang-Chieh Chien, Po-Chung Cheng, Tzung-Chi Fu +1 more | 2020-11-17 |
| 10824083 | Light source, EUV lithography system, and method for generating EUV radiation | Chi YANG, Ssu-Yu Chen, Shang-Chieh Chien, Chieh Hsieh, Tzung-Chi Fu +2 more | 2020-11-03 |
| 10802405 | Radiation source for lithography exposure process | Chieh Hsieh, Shang-Chieh Chien, Po-Chung Cheng | 2020-10-13 |
| 10802406 | Apparatus and method for generating extreme ultraviolet radiation | Chieh Hsieh, Kuan-Hung Chen, Chun-Chia Hsu, Shang-Chieh Chien, Liu Bo-Tsun +1 more | 2020-10-13 |
| 10802394 | Method for discharging static charges on reticle | Hsiao-Lun Chang, Chueh-Chi Kuo, Tsung-Yen Lee, Tzung-Chi Fu, Po-Chung Cheng +1 more | 2020-10-13 |
| 10795264 | Light source for lithography exposure process | Hsin-Feng Chen, Han-Lung Chang, Bo-Tsun Liu | 2020-10-06 |
| 10791616 | Radiation source apparatus | Ssu-Yu Chen, Chi-Ming Yang, Che-Chang Hsu, Shang-Chieh Chien, Po-Chung Cheng | 2020-09-29 |
| 10779387 | Extreme ultraviolet photolithography system and method | Ming-Hsun Tsai, Han-Lung Chang, Yen-Hsun Chen, Shao-Hua Wang, Po-Chung Cheng | 2020-09-15 |
| 10747119 | Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source | Yu-Chih Huang, Chi-Ming Yang, Che-Chang Hsu, Po-Chung Cheng | 2020-08-18 |
| 10725384 | Communication control method | Chao-Chen Chang, Shao-Wei Luo, Shang-Chieh Chien, Po-Chung Cheng | 2020-07-28 |
| 10718718 | EUV vessel inspection method and related system | Chun-Lin Chang, Shang-Chieh Chien, Shang-Ying WU, Li-Kai Cheng, Tzung-Chi Fu +4 more | 2020-07-21 |
| 10720419 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Po-Chung Cheng +1 more | 2020-07-21 |