Issued Patents 2020
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10867933 | Method for forming semiconductor device structure with overlay grating | Long Chen, Jia-Hong Chu, Chi-Wen Lai, Chia-Ching Liang, Kai-Hsiung Chen +4 more | 2020-12-15 |
| 10861698 | Pattern fidelity enhancement | Yu-Tien Shen, Ya-Wen Yeh, Wei-Liang Lin, Ya Hui Chang, Yung-Sung Yen +3 more | 2020-12-08 |
| 10853552 | Method for improving circuit layout for manufacturability | Yun Wu, Cheng-Cheng Kuo, Chia-Ping Chiang, Chih-Wei Hsu, Hua-Tai Lin +2 more | 2020-12-01 |
| 10818509 | Method of fabricating semiconductor device with reduced trench distortions | Yung-Sung Yen, Chung-Ju Lee, Chun-Kuang Chen, Chia-Tien Wu, Ta-Ching Yu +4 more | 2020-10-27 |
| 10734325 | Method for forming semiconductor device structure with overlay grating | Long Chen, Jia-Hong Chu, Chi-Wen Lai, Chia-Ching Liang, Kai-Hsiung Chen +4 more | 2020-08-04 |
| 10727061 | Method for integrated circuit patterning | Tsung-Lin Yang, Hua Feng Chen, Min-Yann Hsieh, Po-Hsueh Li, Shih-Chi Fu +2 more | 2020-07-28 |
| 10658184 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Ching-Yu Chang +7 more | 2020-05-19 |
| 10534272 | Method of fabricating reticle | Hsueh-Yi Chung, Yung-Cheng Chen, Fei-Gwo Tsai, Chi-Hung Liao, Shih-Chi Fu +4 more | 2020-01-14 |