Issued Patents 2020
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879108 | Topographic planarization method for lithography process | Tzu-Yang Lin, Cheng-Han Wu, Chin-Hsiang Lin | 2020-12-29 |
| 10866515 | Lithography process using photoresist material with photosensitive functional group | Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin, Siao-Shan Wang | 2020-12-15 |
| 10866517 | Lithography techniques for reducing resist swelling | Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-15 |
| 10691023 | Method for performing lithography process with post treatment | Ching-Yu Chang, Chin-Hsiang Lin | 2020-06-23 |