Issued Patents 2020
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10866515 | Lithography process using photoresist material with photosensitive functional group | Ming-Hui Weng, Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-15 |
| 10863630 | Material composition and methods thereof | Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2020-12-08 |
| 10747114 | Blocking layer material composition and methods thereof in semiconductor manufacturing | Chen-Yu Liu, Ching-Yu Chang, Chin-Hsiang Lin | 2020-08-18 |
| 10672610 | Grafting design for pattern post-treatment in semiconductor manufacturing | Ching-Yu Chang, Chin-Hsiang Lin | 2020-06-02 |
| 10672619 | Material composition and methods thereof | Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin | 2020-06-02 |