Issued Patents 2020
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10854427 | Radio frequency (RF) pulsing impedance tuning with multiplier mode | Katsumasa Kawasaki, Justin Phi, Sergio Fukuda Shoji, Daisuke Shimizu | 2020-12-01 |
| 10854425 | Feedforward temperature control for plasma processing apparatus | Chetan Mahadeswaraswamy, Walter R. Merry, Sergio Fukuda Shoji, Chunlei Zhang, Yashaswini B. Pattar +7 more | 2020-12-01 |
| 10818561 | Process monitor device having a plurality of sensors arranged in concentric circles | Leonard Tedeschi | 2020-10-27 |
| 10818472 | Methods of optical device fabrication using an electron beam apparatus | Ludovic Godet, Rutger Meyer Timmerman Thijssen, Yang Yang, Manivannan Thothadri, Chien-An Chen | 2020-10-27 |
| 10811226 | Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates | James D. Carducci, Kenneth S. Collins, Richard Fovell, Jason A. Kenney, Shahid Rauf | 2020-10-20 |
| 10790153 | Methods and apparatus for electron beam etching process | Yue Guo, Yang Yang, Kenneth S. Collins, Steven Lane, Gonzalo Monroy +1 more | 2020-09-29 |
| 10784132 | Method and apparatus for de-chucking a workpiece using a swing voltage sequence | Haitao Wang, Wonseok Lee, Sergio Fukuda Shoji, Chunlei Zhang | 2020-09-22 |
| 10784085 | Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber | Kenneth S. Collins, Steven Lane, Yang Yang, Lawrence Wong | 2020-09-22 |
| 10770270 | High power electrostatic chuck with aperture-reducing plug in a gas hole | Jaeyong Cho, Haitao Wang, Vijay D. Parkhe, Chunlei Zhang | 2020-09-08 |
| 10770267 | Methods and apparatus for supplying RF power to plasma chambers | Smbat KARTASHYAN, David Totedo, Jay Merkel, Omid Amirkiai | 2020-09-08 |
| 10745807 | Showerhead with reduced backside plasma ignition | Haitao Wang, Hamid Noorbakhsh, Chunlei Zhang, Sergio Fukuda Shoji, Roland Smith +1 more | 2020-08-18 |
| 10718719 | Particle monitoring device | Leonard Tedeschi | 2020-07-21 |
| 10707086 | Etching methods | Yang Yang, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Lucy Chen +1 more | 2020-07-07 |
| 10672591 | Apparatus for removing particles from a twin chamber processing system | Andrew Nguyen, Tom K. Cho, Yogananda Sarode Vishwanath | 2020-06-02 |
| 10656194 | Real-time measurement of a surface charge profile of an electrostatic chuck | Haitao Wang, Lawrence Wong, Chunlei Zhang | 2020-05-19 |
| 10615006 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-04-07 |
| 10615004 | Distributed electrode array for plasma processing | Kenneth S. Collins, Michael R. Rice, James D. Carducci, Yue Guo, Olga Regelman | 2020-04-07 |
| 10580620 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-03-03 |
| 10544505 | Deposition or treatment of diamond-like carbon in a plasma reactor | Yang Yang, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Lucy Chen +1 more | 2020-01-28 |
| 10546731 | Method, apparatus and system for wafer dechucking using dynamic voltage sweeping | Haitao Wang, Michael G. Chafin, Yue Guo, Valentin N. Todorow, Kenny L. Doan +3 more | 2020-01-28 |
| 10546728 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-01-28 |
| 10535502 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-01-14 |