Issued Patents 2020
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10825708 | Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability | Samer Banna, Imad Yousif, Albert Wang, Gary Leray | 2020-11-03 |
| 10573493 | Inductively coupled plasma apparatus | Samer Banna, Ankur Agarwal, Zhigang Chen, TSE-CHIANG WANG, Andrew Nguyen +2 more | 2020-02-25 |
| 10553398 | Power deposition control in inductively coupled plasma (ICP) reactors | Samer Banna, Tza-Jing Gung, Vladimir Knyazik, Kyle Tantiwong, Dan Marohl +1 more | 2020-02-04 |
| 10546731 | Method, apparatus and system for wafer dechucking using dynamic voltage sweeping | Haitao Wang, Michael G. Chafin, Kartik Ramaswamy, Yue Guo, Kenny L. Doan +3 more | 2020-01-28 |