Issued Patents 2020
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10847351 | Plasma chamber with tandem processing regions | Yogananda Sarode Vishwanath, Xue Yang Chang | 2020-11-24 |
| 10840062 | Radio frequency filter system for a processing chamber | Michael G. Chafin, Lu Liu, Anilkumar Rayaroth | 2020-11-17 |
| 10811233 | Process chamber having tunable showerhead and tunable liner | Xue Yang Chang, Haitao Wang, Kei-Yu Ko, Reza Sadjadi | 2020-10-20 |
| 10770269 | Apparatus and methods for reducing particles in semiconductor process chambers | Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom Choi, Kenneth S. Collins +3 more | 2020-09-08 |
| 10770328 | Substrate support with symmetrical feed structure | Xing Lin, Douglas A. Buchberger, Jr., Xiaoping Zhou, Anchel Sheyner | 2020-09-08 |
| 10672591 | Apparatus for removing particles from a twin chamber processing system | Tom K. Cho, Kartik Ramaswamy, Yogananda Sarode Vishwanath | 2020-06-02 |
| 10658161 | Method and apparatus for reducing particle defects in plasma etch chambers | Xikun Wang, Changhun Lee, Xiaoming He, Meihua Shen | 2020-05-19 |
| 10615006 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2020-04-07 |
| 10580620 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2020-03-03 |
| 10573493 | Inductively coupled plasma apparatus | Valentin N. Todorow, Samer Banna, Ankur Agarwal, Zhigang Chen, TSE-CHIANG WANG +2 more | 2020-02-25 |
| 10546728 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2020-01-28 |
| 10535502 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2020-01-14 |