Issued Patents 2020
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10658161 | Method and apparatus for reducing particle defects in plasma etch chambers | Xikun Wang, Andrew Nguyen, Xiaoming He, Meihua Shen | 2020-05-19 |
CL
Changhun Lee
Overall (2020): #516,143 of 565,922Top 95%
1
Patents 2020