Issued Patents 2020
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10822721 | Method to improve MOCVD reaction process by forming protective film | Shiping Guo | 2020-11-03 |
| 10658161 | Method and apparatus for reducing particle defects in plasma etch chambers | Xikun Wang, Andrew Nguyen, Changhun Lee, Meihua Shen | 2020-05-19 |