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Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates |
James D. Carducci, Kenneth S. Collins, Richard Fovell, Jason A. Kenney, Kartik Ramaswamy |
2020-10-20 |
| 10790180 |
Electrostatic chuck with variable pixelated magnetic field |
Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Ankur Agarwal, Vijay D. Parkhe +2 more |
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| 10770269 |
Apparatus and methods for reducing particles in semiconductor process chambers |
Andrew Nguyen, Bradley J. Howard, Ajit Balakrishna, Tom Choi, Kenneth S. Collins +3 more |
2020-09-08 |
| 10615006 |
Symmetric plasma process chamber |
James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more |
2020-04-07 |
| 10586718 |
Cooling base with spiral channels for ESC |
Vladimir Knyazik, Stephen Prouty, Roland Smith, Denis M. Koosau |
2020-03-10 |
| 10580620 |
Symmetric plasma process chamber |
James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more |
2020-03-03 |
| 10573493 |
Inductively coupled plasma apparatus |
Valentin N. Todorow, Samer Banna, Ankur Agarwal, Zhigang Chen, TSE-CHIANG WANG +2 more |
2020-02-25 |
| 10546728 |
Symmetric plasma process chamber |
James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more |
2020-01-28 |
| 10535502 |
Symmetric plasma process chamber |
James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more |
2020-01-14 |
