Issued Patents 2020
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10845715 | Post exposure processing apparatus | Viachslav Babayan, Kyle M. Hanson, Robert B. Moore | 2020-11-24 |
| 10825665 | Directional treatment for multi-dimensional device processing | Huixiong Dai, Srinivas D. Nemani, Ellie Yieh, Nitin K. Ingle | 2020-11-03 |
| 10818472 | Methods of optical device fabrication using an electron beam apparatus | Rutger Meyer Timmerman Thijssen, Kartik Ramaswamy, Yang Yang, Manivannan Thothadri, Chien-An Chen | 2020-10-27 |
| 10811303 | Methods for gapfill in high aspect ratio structures | Pramit Manna, Rui Cheng, Erica Chen, Ziqing Duan, Abhijit Basu Mallick +1 more | 2020-10-20 |
| 10801890 | Measurement system and a method of diffracting light | Jinxin FU, Yifei Wang, Ian McMackin, Rutger Meyer Timmerman Thijssen | 2020-10-13 |
| 10775158 | System and method for detecting etch depth of angled surface relief gratings | Joseph C. Olson, Rutger Meyer Timmerman Thijssen, Morgan Evans | 2020-09-15 |
| 10770292 | Wafer treatment for achieving defect-free self-assembled monolayers | Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo +5 more | 2020-09-08 |
| 10707118 | Multi stack optical elements using temporary and permanent bonding | Wayne MCMILLAN, Rutger Meyer Timmerman Thijssen, Naamah ARGAMAN, Tapashree Roy, Sage Toko Garrett DOSHAY | 2020-07-07 |
| 10705268 | Gap fill of imprinted structure with spin coated high refractive index material for optical components | Jinxin FU, Wayne MCMILLAN | 2020-07-07 |
| 10636705 | High pressure annealing of metal gate structures | Yifei Wang, Kurtis Leschkies, Fei Wang, Xin Liu, Wei V. Tang +2 more | 2020-04-28 |
| 10615058 | Apparatus for field guided acid profile control in a photoresist layer | Christine Y Ouyang, Viachslav Babayan | 2020-04-07 |
| 10593592 | Laminate and core shell formation of silicide nanowire | Bencherki Mebarki, Annamalai Lakshmanan, Kaushal K. Singh, Paul F. Ma, Mehul Naik +1 more | 2020-03-17 |