Issued Patents 2020
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879081 | Methods of reducing or eliminating defects in tungsten film | Guoqiang Jian, Wei V. Tang, Chi-Chou Lin, Kai Wu, Vikash Banthia +4 more | 2020-12-29 |
| 10784157 | Doped tantalum nitride for copper barrier applications | Annamalai Lakshmanan, Mei Chang, Jennifer Shan | 2020-09-22 |
| 10770292 | Wafer treatment for achieving defect-free self-assembled monolayers | Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo +5 more | 2020-09-08 |
| 10755947 | Methods of increasing selectivity for selective etch processes | Wenyu Zhang, Yixiong Yang, Mario D. Sanchez, Guoqiang Jian, Wei V. Tang | 2020-08-25 |
| 10752990 | Apparatus and methods to remove residual precursor inside gas lines post-deposition | Daping Yao, Kenric Choi, Xiaoxiong Yuan, Jiang Lu, Can Xu +1 more | 2020-08-25 |
| 10707122 | Methods for depositing dielectric barrier layers and aluminum containing etch stop layers | Sree Rangasai V. Kesapragada, Kevin Moraes, Srinivas Guggilla, He Ren, Mehul Naik +6 more | 2020-07-07 |
| 10665450 | Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films | Yixiong Yang, Wei V. Tang, Wenyu Zhang, Shih Chung Chen, CHEN-HAN LIN +6 more | 2020-05-26 |
| 10665542 | Cobalt manganese vapor phase deposition | Sang Ho Yu, Jiang Lu, Ben-Li Sheu | 2020-05-26 |
| 10640870 | Gas feedthrough assembly | Daping Yao, Hyman Lam, Jiang Lu, Dien-Yeh Wu, Can Xu +1 more | 2020-05-05 |
| 10643840 | Selective deposition defects removal by chemical etch | Jeffrey W. Anthis, Chang Ke, Pratham Jain, Benjamin Schmiege, Guoqiang Jian +3 more | 2020-05-05 |
| 10615041 | Methods and materials for modifying the threshold voltage of metal oxide stacks | Siddarth A. Krishnan, Rajesh Sathiyanarayanan, Atashi Basu | 2020-04-07 |
| 10608097 | Low thickness dependent work-function nMOS integration for metal gate | Seshadri Ganguli, Shih Chung Chen, Rajesh Sathiyanarayanan, Atashi Basu, Lin Dong +3 more | 2020-03-31 |
| 10600685 | Methods to fill high aspect ratio features on semiconductor substrates with MOCVD cobalt film | Daping Yao, Jiang Lu, Can Xu, Mei Chang | 2020-03-24 |
| 10593592 | Laminate and core shell formation of silicide nanowire | Bencherki Mebarki, Annamalai Lakshmanan, Kaushal K. Singh, Mehul Naik, Andrew Cockburn +1 more | 2020-03-17 |
| 10559578 | Deposition of cobalt films with high deposition rate | Jacqueline S. Wrench, Jing Zhou, Fuqun Grace Vasiknanonte, Jiang Lu, Nobuyuki Sasaki +3 more | 2020-02-11 |