Issued Patents 2020
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879090 | High temperature process chamber lid | Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao | 2020-12-29 |
| 10784157 | Doped tantalum nitride for copper barrier applications | Annamalai Lakshmanan, Paul F. Ma, Jennifer Shan | 2020-09-22 |
| 10752990 | Apparatus and methods to remove residual precursor inside gas lines post-deposition | Daping Yao, Kenric Choi, Xiaoxiong Yuan, Jiang Lu, Can Xu +1 more | 2020-08-25 |
| 10559578 | Deposition of cobalt films with high deposition rate | Jacqueline S. Wrench, Jing Zhou, Fuqun Grace Vasiknanonte, Jiang Lu, Paul F. Ma +3 more | 2020-02-11 |