Issued Patents 2020
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10752990 | Apparatus and methods to remove residual precursor inside gas lines post-deposition | Kenric Choi, Xiaoxiong Yuan, Jiang Lu, Can Xu, Paul F. Ma +1 more | 2020-08-25 |
| 10640870 | Gas feedthrough assembly | Hyman Lam, Jiang Lu, Dien-Yeh Wu, Can Xu, Paul F. Ma +1 more | 2020-05-05 |
| 10600685 | Methods to fill high aspect ratio features on semiconductor substrates with MOCVD cobalt film | Jiang Lu, Can Xu, Paul F. Ma, Mei Chang | 2020-03-24 |