Issued Patents 2020
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10790287 | Reducing gate induced drain leakage in DRAM wordline | Sung-Kwan Kang, Gill Yong Lee, Shih Chung Chen, Jeffrey W. Anthis | 2020-09-29 |
| 10699946 | Method of enabling seamless cobalt gap-fill | Bhushan Zope, Avgerinos V. Gelatos, Bo Zheng, Yu Lei, Xinyu Fu +2 more | 2020-06-30 |
| 10665542 | Cobalt manganese vapor phase deposition | Paul F. Ma, Jiang Lu, Ben-Li Sheu | 2020-05-26 |
| 10608097 | Low thickness dependent work-function nMOS integration for metal gate | Paul F. Ma, Seshadri Ganguli, Shih Chung Chen, Rajesh Sathiyanarayanan, Atashi Basu +3 more | 2020-03-31 |
| 10559578 | Deposition of cobalt films with high deposition rate | Jacqueline S. Wrench, Jing Zhou, Fuqun Grace Vasiknanonte, Jiang Lu, Paul F. Ma +3 more | 2020-02-11 |