Issued Patents 2020
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10790287 | Reducing gate induced drain leakage in DRAM wordline | Sung-Kwan Kang, Gill Yong Lee, Sang Ho Yu, Shih Chung Chen | 2020-09-29 |
| 10790188 | Seamless ruthenium gap fill | Nasrin Kazem, David Thompson | 2020-09-29 |
| 10752649 | Metal precursors with modified diazabutadiene ligands for CVD and ALD and methods of use | Atashi Basu, David Thompson, Nasrin Kazem | 2020-08-25 |
| 10738008 | Nitrogen-containing ligands and their use in atomic layer deposition methods | David Thompson | 2020-08-11 |
| 10699897 | Acetylide-based silicon precursors and their use as ALD/CVD precursors | Mark Saly, Bhaskar Jyoti Bhuyan, Feng Q. Liu, David Thompson | 2020-06-30 |
| 10643840 | Selective deposition defects removal by chemical etch | Chang Ke, Pratham Jain, Benjamin Schmiege, Guoqiang Jian, Michael S. Jackson +3 more | 2020-05-05 |
| 10643838 | In-situ formation of non-volatile lanthanide thin film precursors and use in ALD and CVD | Benjamin Schmiege, David Thompson | 2020-05-05 |
| 10633743 | System and method for controllable non-volatile metal removal | Tsung-Liang Chen, Benjamin Schmiege, Glen Gilchrist | 2020-04-28 |
| 10577386 | Ruthenium precursors for ALD and CVD thin film deposition and uses thereof | Benjamin Schmiege, David Thompson | 2020-03-03 |