Issued Patents 2020
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10847360 | High pressure treatment of silicon nitride film | Keith Tatseun Wong, Sean S. Kang, Srinivas D. Nemani | 2020-11-24 |
| 10825665 | Directional treatment for multi-dimensional device processing | Ludovic Godet, Huixiong Dai, Srinivas D. Nemani, Nitin K. Ingle | 2020-11-03 |
| 10811250 | Silicon nitride films with high nitrogen content | Atashi Basu, Srinivas D. Nemani | 2020-10-20 |
| 10720341 | Gas delivery system for high pressure processing chamber | Qiwei Liang, Srinivas D. Nemani, Sean S. Kang, Adib Khan | 2020-07-21 |
| 10714331 | Method to fabricate thermally stable low K-FinFET spacer | Mihaela Balseanu, Srinivas D. Nemani, Mei-Yee Shek | 2020-07-14 |
| 10692734 | Methods of patterning nickel silicide layers on a semiconductor device | Jong Mun Kim, Chentsau Chris Ying, He Ren, Srinivas D. Nemani | 2020-06-23 |
| 10636704 | Seam-healing method upon supra-atmospheric process in diffusion promoting ambient | Bencherki Mebarki, Sean S. Kang, Keith Tatseun Wong, He Ren, Mehul Naik +1 more | 2020-04-28 |
| 10622214 | Tungsten defluorination by high pressure treatment | Keith Tatseun Wong, Thomas Jongwan Kwon, Sean S. Kang | 2020-04-14 |
| 10590530 | Gas control in process chamber | Qiwei Liang, Srinivas D. Nemani | 2020-03-17 |
| 10586707 | Selective deposition of metal silicides | Raymond Hung, Namsung Kim, Srinivas D. Nemani, Jong Hun Choi, Christopher Ahles +1 more | 2020-03-10 |
| 10570506 | Method to improve film quality for PVD carbon with reactive gas and bias power | Bhargav S. Citla, Jingjing Liu, Zhong Qiang Hua, Chentsau Ying, Srinivas D. Nemani | 2020-02-25 |
| 10566188 | Method to improve film stability | Maximillian Clemons, Michel R. Frei, Mahendra Pakala, Mehul Naik, Srinivas D. Nemani | 2020-02-18 |
| 10566226 | Multi-cassette carrying case | Sriskantharajah Thirunavukarasu, Eng Sheng Peh, Srinivas D. Nemani, Arvind Sundarrajan, Avinash Avula +2 more | 2020-02-18 |