Issued Patents 2020
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10692734 | Methods of patterning nickel silicide layers on a semiconductor device | Chentsau Chris Ying, He Ren, Srinivas D. Nemani, Ellie Yieh | 2020-06-23 |
| 10685849 | Damage free metal conductor formation | He Ren, Maximillian Clemons, Minrui Yu, Mehul Naik, Chentsau Chris Ying | 2020-06-16 |
| 10643854 | Silicon dioxide-polysilicon multi-layered stack etching with plasma etch chamber employing non-corrosive etchants | Daisuke Shimizu | 2020-05-05 |