Issued Patents All Time
Showing 76–100 of 102 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5849602 | Resist processing process | Kouji Okamura | 1998-12-15 |
| 5844662 | Resist processing apparatus and a resist processing method | Hikaru Itoh | 1998-12-01 |
| 5826129 | Substrate processing system | Keizo Hasebe, Shinji Nagashima, Norio Semba, Yoshio Kimura, Naruaki Iida +3 more | 1998-10-20 |
| 5803932 | Resist processing apparatus having an interface section including two stacked substrate waiting tables | Shizuo Ogawa, Toshihiko Nagano | 1998-09-08 |
| 5772764 | Coating apparatus | — | 1998-06-30 |
| 5711646 | Substrate transfer apparatus | Issei Ueda, Hiroyuki Kudou | 1998-01-27 |
| 5651160 | Cleaning apparatus for cleaning substrates | Akira Yonemizu | 1997-07-29 |
| 5626675 | Resist processing apparatus, substrate processing apparatus and method of transferring a processed article | Yasuhiro Sakamoto, Kiyohisa Tateyama, Shinzi Kitamura | 1997-05-06 |
| 5620560 | Method and apparatus for heat-treating substrate | Yasuhiro Sakamoto, Kouji Harada | 1997-04-15 |
| 5460478 | Method for processing wafer-shaped substrates | Kazutoshi Yoshioka, Naruaki Iida | 1995-10-24 |
| 5442416 | Resist processing method | Kiyohisa Tateyama, Mitsuru Ushijima | 1995-08-15 |
| 5416047 | Method for applying process solution to substrates | Nobuo Konishi, Hideyuki Takamori, Kiyohisa Tateyama, Masaaki Murakami, Norimitsu Morioka +1 more | 1995-05-16 |
| 5405443 | Substrates processing device | Kazuyuki Gotou, Yasushi Ito, Katsuya Okumura | 1995-04-11 |
| 5364222 | Apparatus for processing wafer-shaped substrates | Kazutoshi Yoshioka, Naruaki Iida | 1994-11-15 |
| 5361449 | Cleaning apparatus for cleaning reverse surface of semiconductor wafer | — | 1994-11-08 |
| 5339128 | Resist processing method | Kiyohisa Tateyama, Mitsuru Ushijima | 1994-08-16 |
| 5312487 | Coating apparatus | Akihiro Fujimoto, Haruo Iwatsu | 1994-05-17 |
| 5297910 | Transportation-transfer device for an object of treatment | Kazutoshi Yoshioka, Kenji Yokomizo, Yuji Yoshimoto | 1994-03-29 |
| D341418 | Supply nozzle for applying liquid resist to a semiconductor wafer | — | 1993-11-16 |
| 5250114 | Coating apparatus with nozzle moving means | Nobuo Konishi, Hideyuki Takamori, Kiyohisa Tateyama | 1993-10-05 |
| 5202716 | Resist process system | Kiyohisa Tateyama, Mitsuru Ushijima | 1993-04-13 |
| 5177514 | Apparatus for coating a photo-resist film and/or developing it after being exposed | Mitsuru Ushijima | 1993-01-05 |
| 5089305 | Coating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by state | Mitsuru Ushijima, Osamu Hirakawa, Yoshio Kimura, Noriyuki Anai | 1992-02-18 |
| 5061144 | Resist process apparatus | Yoshio Kimura, Osamu Hirakawa, Noriyuki Anai, Masanori Tateyama, Yasuhiro Sakamoto | 1991-10-29 |
| 5028955 | Exposure apparatus | Yasushi Hayashida, Noriyuki Anai, Osamu Hirakawa, Yasuhiro Sakamoto, Keisuke Shigaki +1 more | 1991-07-02 |