Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6749688 | Coating method and apparatus for semiconductor process | Kiyohisa Tateyama, Kimio Motoda | 2004-06-15 |
| 6635113 | Coating apparatus and coating method | Hideyuki Takamori, Masafumi Nomura, Kiyohisa Tateyama, Tsutae Omori | 2003-10-21 |
| 6458208 | Film forming apparatus | Tsutae Omori, Masaaki Takizawa, Mitsuhiro Sakai | 2002-10-01 |
| 6451515 | Substrate treating method | Hideyuki Takamori, Kiyohisa Tateyama, Kengo Mizosaki, Yoshitaka Matsuda | 2002-09-17 |
| 6444409 | Coating and developing method | Shinichiro Araki, Shinko Matsumoto | 2002-09-03 |
| 6443641 | Substrate process method and substrate process apparatus | Hideyuki Takamori, Kiyohisa Tateyama, Kengo Mizosaki, Mitsuhiro Sakai, Shinobu Tanaka +2 more | 2002-09-03 |
| 6270576 | Coating and developing apparatus | Shinichiro Araki, Shinko Matsumoto | 2001-08-07 |
| 6261007 | Substrate process method and substrate process apparatus | Hideyuki Takamori, Kiyohisa Tateyama, Kengo Mizosaki, Mitsuhiro Sakai, Shinobu Tanaka +2 more | 2001-07-17 |
| 6165552 | Film forming method | Tsutae Omori, Masaaki Takizawa, Mitsuhiro Sakai | 2000-12-26 |
| 6079428 | Apparatus for removing coated film from peripheral portion of substrate | — | 2000-06-27 |
| D415776 | Apparatus for manufacturing a semiconductor for a liquid crystal display | Tsutae Omori, Shinkou Matsumoto | 1999-10-26 |
| D415184 | Apparatus for manufacturing a semiconductor for a liquid crystal display | Tsutae Omori, Shinkou Matsumoto | 1999-10-12 |
| 5919520 | Coating method and apparatus for semiconductor process | Kiyohisa Tateyama, Kimio Motoda | 1999-07-06 |
| 5887604 | Washing apparatus, and washing method | Shinya Murakami, Yuuji Kamikawa, Sinichiro Izumi, Takami Satoh, Hirofumi Shiraishi +3 more | 1999-03-30 |
| 5782990 | Method for washing objects | Shinya Murakami, Yuuji Kamikawa, Sinichiro Izumi, Takami Satoh, Hirofumi Shiraishi +3 more | 1998-07-21 |
| 5688322 | Apparatus for coating resist on substrate | Kimio Motoda, Kiyohisa Tateyama | 1997-11-18 |
| 5681614 | Hydrophobic treatment method involving delivery of a liquid process agent to a process space | Tsutae Omori, Kouji Harada, Takami Satoh, Masafumi Nomura | 1997-10-28 |
| 5671764 | Washing apparatus, and washing method | Shinya Murakami, Yuuji Kamikawa, Sinichiro Izumi, Takami Satoh, Hirofumi Shiraishi +3 more | 1997-09-30 |
| 5518552 | Method for scrubbing and cleaning substrate | Kouichi Tanoue, Shinzi Kitamura, Takami Satoh, Takayuki Tomoeda, Tatsuya Iwasaki +1 more | 1996-05-21 |
| 5505781 | Hydrophobic processing apparatus including a liquid delivery system | Tsutae Omori, Kouji Harada, Takami Satoh, Masafumi Nomura | 1996-04-09 |
| 5488964 | Washing apparatus, and washing method | Shinya Murakami, Yuji Kamikawa, Sinichiro Izumi, Takami Satoh, Hirofumi Shiraishi +3 more | 1996-02-06 |
| 5345639 | Device and method for scrubbing and cleaning substrate | Kouichi Tanoue, Shinzi Kitamura, Takami Satoh, Takayuki Tomoeda, Tatsuya Iwasaki +1 more | 1994-09-13 |
| 5089305 | Coating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by state | Mitsuru Ushijima, Osamu Hirakawa, Masami Akimoto, Yoshio Kimura | 1992-02-18 |
| 5061144 | Resist process apparatus | Masami Akimoto, Yoshio Kimura, Osamu Hirakawa, Masanori Tateyama, Yasuhiro Sakamoto | 1991-10-29 |
| 5028955 | Exposure apparatus | Yasushi Hayashida, Osamu Hirakawa, Masami Akimoto, Yasuhiro Sakamoto, Keisuke Shigaki +1 more | 1991-07-02 |