Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8574676 | Substrate processing method | Kanji Yasui, Hiroshi Nishiyama, Yasunobu Inoue, Katsuhiko Iwabuchi | 2013-11-05 |
| 7569124 | Anodic oxidation apparatus | Yasushi Yagi, Yoshifumi Watabe, Takuya Komoda, Koichi Aizawa | 2009-08-04 |
| 7169283 | Anodization device and anodization method | Yasushi Yagi, Kazutsugu Aoki | 2007-01-30 |
| 7118663 | Anodic oxidizer, anodic oxidation method | Yasushi Yagi, Kazutsugu Aoki | 2006-10-10 |
| 6378078 | Semiconductor integrated circuit supervising an illicit address operation | — | 2002-04-23 |
| 5442416 | Resist processing method | Kiyohisa Tateyama, Masami Akimoto | 1995-08-15 |
| 5393624 | Method and apparatus for manufacturing a semiconductor device | — | 1995-02-28 |
| 5339128 | Resist processing method | Kiyohisa Tateyama, Masami Akimoto | 1994-08-16 |
| 5202716 | Resist process system | Kiyohisa Tateyama, Masami Akimoto | 1993-04-13 |
| 5177514 | Apparatus for coating a photo-resist film and/or developing it after being exposed | Masami Akimoto | 1993-01-05 |
| 5089305 | Coating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by state | Osamu Hirakawa, Masami Akimoto, Yoshio Kimura, Noriyuki Anai | 1992-02-18 |
| 5002008 | Coating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by state | Osamu Hirakawa, Masami Akimoto, Yoshio Kimura, Noriyuki Anai | 1991-03-26 |
| 4985722 | Apparatus for coating a photo-resist film and/or developing it after being exposed | Masami Akimoto | 1991-01-15 |