Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10600621 | Plasma electrode and plasma processing device | Masato Morishima, Takashi Fuse, Madoka Fujimoto, Daisuke Nishide | 2020-03-24 |
| 8574676 | Substrate processing method | Kanji Yasui, Hiroshi Nishiyama, Yasunobu Inoue, Mitsuru Ushijima | 2013-11-05 |
| 8196619 | Load lock apparatus, processing system and substrate processing method | — | 2012-06-12 |
| 7916447 | Electrostatic chuck for substrate stage, electrode used for the chuck, and treating system having the chuck and electrode | Toshiki Kobayashi | 2011-03-29 |
| 7780391 | Substrate processing device | Takaaki Matsuoka, Shigeru Ishizawa, Tsutomu Hiroki | 2010-08-24 |
| 7624772 | Load lock apparatus, processing system and substrate processing method | — | 2009-12-01 |
| 6432208 | Plasma processing apparatus | Satoru Kawakami, Ryo Kuwajima, Ryusuke Ushikoshi, Naohito Yamada, Tetsuya Kawajiri | 2002-08-13 |
| 6022418 | Vacuum processing method | — | 2000-02-08 |
| 5697749 | Wafer processing apparatus | Eiichirou Takanabe | 1997-12-16 |
| 5462397 | Processing apparatus | — | 1995-10-31 |
| 5407350 | Heat-treatment apparatus | Takeo Suzuki, Takashi Tozawa, Satoshi Kagatsume, Hirotsugu Shiraiwa | 1995-04-18 |
| 5016567 | Apparatus for treatment using gas | Osamu Yokokawa, Eiichiro Takanabe | 1991-05-21 |