Issued Patents All Time
Showing 76–100 of 125 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8631379 | Decomposing integrated circuit layout | Pi-Tsung Chen, Ming-Hui Chih, Ken-Hsien Hsieh, Wei-Long Wang, Wen-Chun Huang +4 more | 2014-01-14 |
| 8617410 | Method and system for wafer inspection | Chang-Cheng Hung | 2013-12-31 |
| 8563198 | Device and method for providing wavelength reduction with a photomask | Burn Jeng Lin, Jeng-Horng Chen, Chun-Kuang Chen, Ru-Gun Liu, Jen-Chieh Shih | 2013-10-22 |
| 8431291 | Intensity selective exposure photomask | George Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2013-04-30 |
| 8381139 | Method for metal correlated via split for double patterning | Burn Jeng Lin, Ru-Gun Liu, Wen-Chun Huang | 2013-02-19 |
| 8381153 | Dissection splitting with optical proximity correction and mask rule check enforcement | Chia-Ping Chiang, Yu-Po Tang, Ming-Hui Chih, Cheng Kun Tsai, Wei-Long Wang +7 more | 2013-02-19 |
| 8264662 | In-line particle detection for immersion lithography | Li-Jui Chen, Chi-Kang Peng | 2012-09-11 |
| 8216767 | Patterning process and chemical amplified photoresist with a photodegradable base | Chien-Wei Wang, Ching-Yu Chang, Burn Jeng Lin | 2012-07-10 |
| 8179536 | Measurement of overlay offset in semiconductor processing | Te-Chih Huang, Chih-Ming Ke | 2012-05-15 |
| 8125611 | Apparatus and method for immersion lithography | Ching-Yu Chang, Burn Jeng Lin | 2012-02-28 |
| 8038897 | Method and system for wafer inspection | Chang-Cheng Hung | 2011-10-18 |
| 8027529 | System for improving critical dimension uniformity | Shinn-Sheng Yu, Chih-Ming Ke, Jacky Huang, Chun-Kuang Chen | 2011-09-27 |
| 7934177 | Method and system for a pattern layout split | Jaw-Jung Shin, King-Chang Shu, Burn Jeng Lin | 2011-04-26 |
| 7924401 | Seal ring arrangements for immersion lithography systems | Burn Jeng Lin, Chun-Kuang Chen, Ru-Gun Liu, Shinn-Sheng Yu, Jen-Chieh Shih | 2011-04-12 |
| 7897297 | Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask | Chih-Ming Ke, Shinn-Sheng Yu, Hung-Chang Hsieh | 2011-03-01 |
| 7858404 | Measurement of overlay offset in semiconductor processing | Te-Chih Huang, Chih-Ming Ke | 2010-12-28 |
| 7851774 | System and method for direct writing to a wafer | Burn Jeng Lin, Jeng-Horng Chen, Shy-Jay Lin | 2010-12-14 |
| 7838386 | Method and system for patterning alignment marks on a transparent substrate | Ruei-Hung Jang, Ya-Wen Lee, Tzu-Yang Wu, Sheng-Liang Pan, Chin-Hsiang Lin | 2010-11-23 |
| 7800731 | Method and apparatus for removing particles in immersion lithography | Hsin Chang, Tzung-Chi Fu | 2010-09-21 |
| 7796249 | Mask haze early detection | Wen-Chuan Wang, Shy-Jay Lin, Te-Chih Huang, Chih-Ming Ke, Wei-Yu Su +2 more | 2010-09-14 |
| 7787685 | Extracting ordinary and extraordinary optical characteristics for critical dimension measurement of anisotropic materials | Jacky Huang, Chin-Ming Ke | 2010-08-31 |
| 7777884 | Method and system for optimizing sub-nanometer critical dimension using pitch offset | Chih-Ming Ke, Shinn-Sheng Yu, Yu-Hsi Wang, Jacky Huang, Kuo-Chen Huang | 2010-08-17 |
| 7751025 | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control | Li-Jui Chen, Chih-Ming Ke, Bang-Ching Ho, Jen-Chieh Shih | 2010-07-06 |
| 7732109 | Method and system for improving critical dimension uniformity | Shinn-Sheng Yu, Chih-Ming Ke, Jacky Huang, Chun-Kuang Chen | 2010-06-08 |
| 7675604 | Hood for immersion lithography | Li-Jui Chen, Tzung-Chi Fu, Ching-Yu Chang, Fu-Jye Liang, Lin-Hung Shiu +1 more | 2010-03-09 |